Reduced stiction and mechanical memory in MEMS devices
First Claim
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1. A process for packaging a MEMS device, comprising the steps of:
- placing the MEMS device in a package;
introducing a material including deuterium at levels beyond a naturally occurring level into the package; and
sealing the package;
wherein the introducing step comprises the step of introducing water into the package wherein the water includes deuterium at levels beyond a naturally occurring level for water.
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Abstract
A MEMS device is packaged in a process which hydrogen (H) deuterium (D) for reduced stiction. H is exchanged with D by exposing the MEMS device with a deuterium source, such as deuterium gas or heavy water vapor, optionally with the assistance of a direct or downstream plasma.
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Citations
32 Claims
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1. A process for packaging a MEMS device, comprising the steps of:
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placing the MEMS device in a package; introducing a material including deuterium at levels beyond a naturally occurring level into the package; and sealing the package; wherein the introducing step comprises the step of introducing water into the package wherein the water includes deuterium at levels beyond a naturally occurring level for water. - View Dependent Claims (2, 3, 4, 5, 6, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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7. A process for packaging a MEMS device, comprising the steps of:
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placing the MEMS device in a package; introducing a material including deuterium at levels beyond a naturally occurring level into the package; and sealing the package; wherein the introducing step comprises the step of introducing a passivating source material with deuterium into the package in an ambient of heavy water vapor.
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8. A process for packaging a MEMS device, comprising the steps of:
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placing the MEMS device in a package; introducing a material including deuterium at levels beyond a naturally occurring level into the package; and sealing the package; wherein the introducing step comprises the step of introducing a passivating source material including deuterium into the package; and wherein the passivating material includes CH3(CH2)nCOOD.
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9. A process for packaging a MEMS device, comprising the steps of:
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placing the MEMS device in a package; introducing a material including deuterium at levels beyond a naturally occurring level into the package; and sealing the package; wherein the introducing step comprises the step of introducing a passivating source material including deuterium into the package; and wherein the passivating material includes CD3(CD2)nCOOH.
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10. A packaged MEMS device, comprising:
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a MEMS device; a sealed package surrounding the MEMS device; and a material including deuterium at levels beyond a naturally occurring level disposed in the package; wherein the material includes water with deuterium at levels beyond a naturally occurring level for water. - View Dependent Claims (11, 12, 13, 28, 29, 30, 31, 32)
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14. A packaged a MEMS device, comprising:
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a MEMS device; a sealed package surrounding the MEMS device; a material including deuterium at levels beyond a naturally occurring level disposed in the package; wherein the material is a passivating source material including deuterium; and wherein the passivating material includes CH3(CH2)nCOOD.
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15. A packaged a MEMS device, comprising:
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a MEMS device; a sealed package surrounding the MEMS device; a material including deuterium at levels beyond a naturally occurring level disposed in the package; wherein the material is a passivating source material including deuterium; and wherein the passivating material includes CD3(CD2)nCOOH.
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Specification