Device and method for the optical measurement of an optical system by using an immersion fluid
First Claim
1. A projection optical system inspecting method that inspects the optical performance of a projection optical system used for immersion exposure, the method comprising:
- providing an optical member in an image plane side of the projection optical system;
providing a detector;
supplying a liquid to the image plane side of the projection optical system; and
photoelectrically detecting a measuring beam that passes through the projection optical system, the liquid and the optical member with a CCD array.
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Accused Products
Abstract
A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.
195 Citations
14 Claims
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1. A projection optical system inspecting method that inspects the optical performance of a projection optical system used for immersion exposure, the method comprising:
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providing an optical member in an image plane side of the projection optical system; providing a detector; supplying a liquid to the image plane side of the projection optical system; and photoelectrically detecting a measuring beam that passes through the projection optical system, the liquid and the optical member with a CCD array. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A projection optical system inspection apparatus that inspects the optical performance of a projection optical system used for immersion exposure, the projection optical system inspection apparatus comprising:
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a flat part disposed on an image plane side of the projection optical system; and a photoelectric detector that photoelectrically detects a measuring beam, the measuring beam passing through in order of the projection optical system, a liquid disposed between the projection optical system and the flat part, and the flat part, wherein the photoelectric detector is a CCD array. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14)
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Specification