Micro-electromechanical system devices
First Claim
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1. A micro-electromechanical system (MEMS) device, comprising:
- a semiconductive layer disposed over a substrate;
a trench disposed in the semiconductive layer, the trench comprising a first sidewall and an opposite second sidewall;
a first insulating material layer disposed over an upper portion of the first sidewall;
a conductive material disposed within the trench;
a first air gap disposed between the conductive material and the semiconductive layer; and
a second air gap disposed over the substrate, the second air gap disposed between the substrate and a bottom surface of the semiconductive layer; and
a second insulating layer disposed between the substrate and the bottom surface of the semiconductive layer.
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Abstract
Micro-electromechanical system (MEMS) devices and methods of manufacture thereof are disclosed. In one embodiment, a MEMS device includes a semiconductive layer disposed over a substrate. A trench is disposed in the semiconductive layer, the trench with a first sidewall and an opposite second sidewall. A first insulating material layer is disposed over an upper portion of the first sidewall, and a conductive material disposed within the trench. An air gap is disposed between the conductive material and the semiconductive layer.
22 Citations
28 Claims
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1. A micro-electromechanical system (MEMS) device, comprising:
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a semiconductive layer disposed over a substrate; a trench disposed in the semiconductive layer, the trench comprising a first sidewall and an opposite second sidewall; a first insulating material layer disposed over an upper portion of the first sidewall; a conductive material disposed within the trench; a first air gap disposed between the conductive material and the semiconductive layer; and a second air gap disposed over the substrate, the second air gap disposed between the substrate and a bottom surface of the semiconductive layer; and a second insulating layer disposed between the substrate and the bottom surface of the semiconductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A micro-electromechanical system (MEMS) device, comprising:
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a semiconductive layer disposed over a substrate; a first trench disposed in the semiconductive layer, the trench comprising a first sidewall and an opposite second sidewall; a first insulating material layer disposed over an upper portion of the first sidewall of the semiconductive layer; a conductive material disposed within the trench, the conductive material comprising a first sidewall and an opposite second sidewall; and a first air gap within the trench, a first portion of the first air gap being disposed between the first sidewall of the conductive material and the first sidewall of the semiconductive layer, a second portion of the first air gap being disposed between the second sidewall of the conductive material and the second sidewall of the semiconductive layer. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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Specification