Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus

• US 8,125,610 B2
• Filed: 12/02/2005
• Issued: 02/28/2012
• Est. Priority Date: 12/02/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Der Hoeven, Jan Cornelis
• Primary Examiner(s): Glick, Edward
• Assistant Examiner(s): LIU, CHIA HOW MICHAEL
• Application Number:
  US11/292,311
• Publication Number:
  US 20070127001A1
• Time in Patent Office: 2,279 Days
• Field of Search: 355/30, 355/72, 355/53, 359/665
• US Class Current: 355/30
• CPC Class Codes: G03F 1/82 Auxiliary processes, e.g. cleaning or inspecting
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Abstract

A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

Claims

1. A method for preventing or reducing contamination of an immersion projection apparatus, the apparatus comprising at least one immersion space that is at least partially filled with an immersion liquid when the apparatus projects a beam of radiation onto a substrate to be illuminated, the immersion space extending at least between at least part of a bare substrate, a bare dummy substrate, a substrate-shaped object or a substrate holder on one side, and a projection system on an opposite side, the method comprising:

placing the bare substrate, the bare dummy substrate, or the substrate-shaped object on the substrate holder;

rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto the substrate to be illuminated to prevent or reduce contamination of the immersion projection apparatus, and

replacing the bare substrate, the bare dummy substrate, or the substrate-shaped object with the substrate to be illuminated by the projected beam of radiation of the projection system after the rinsing has been completed,

wherein the rinsing includes moving the substrate holder with respect to said projection system such that the position of the immersion space changes with respect to the substrate holder during the rinsing in order to rinse at least part of a surface of the substrate holder surrounding the bare substrate, the bare dummy substrate, or the substrate-shaped object and at least one component that is located on the surface of the substrate holder surrounding the bare substrate, the bare dummy substrate, or the substrate-shaped object using the rinsing liquid, the at least one component being selected from the group consisting of;

an edge seal member, a sensor, a positioning device, and a mirror element.

2. A method according to claim 1, wherein the rinsing of the immersion space occurs during an idle operational mode of the apparatus.

3. A method according to claim 1, wherein said immersion liquid and said rinsing liquid are the same type of liquid.

4. A method according to claim 1, wherein the rinsing of the immersion space occurs substantially continuously until the apparatus is used to project radiation onto a substrate.

5. A method according to claim 1, further comprising illuminating at least part of the immersion space with ultraviolet radiation during the rinsing of at least part of the immersion space, before the apparatus is used to project the beam of radiation onto the substrate to be illuminated.

6. A method according to claim 1, wherein the apparatus is a lithographic projection apparatus.

7. The method according to claim 1, wherein the substrate to be illuminated that replaces the bare substrate, the bare dummy substrate, or the substrate-shaped object is a first substrate of a batch of substrates to be illuminated by the projected beam of radiation of the projection system, and wherein the method further comprises illuminating each substrate in the batch of substrates using the projection system.

8. A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including a substrate holder constructed to hold a substrate to be illuminated, a patterning device holder constructed to hold a patterning device, a projection system, and an immersion system configured to at least partially fill an immersion space of the apparatus with a liquid, the immersion space extending at least between at least part of a bare substrate, the bare dummy substrate a substrate-shaped object or the substrate holder on one side, and the projection system on an opposite side, the method comprising:

placing the bare substrate, the bare dummy substrate or the substrate-shaped object on the substrate holder;

moving at least one of the immersion system and at least part of the apparatus relative to each other;

rinsing said at least part of the apparatus with the liquid before the apparatus is used to project a patterned beam of radiation onto a target portion of the substrate to be illuminated to prevent or reduce contamination of the lithographic projection apparatus, and

replacing the bare substrate, the bare dummy substrate, or the substrate-shaped object with the substrate to be illuminated by the projected beam of radiation of the projection system after the rinsing has been completed,

wherein the rinsing includes moving the substrate holder with respect to said projection system such that the position of the immersion space changes with respect to the substrate holder during the rinsing in order to rinse at least part of a surface of the substrate holder surrounding the bare substrate, the bare dummy substrate, or the substrate-shaped object and at least one component that is located on the surface of the substrate holder surrounding the bare substrate, the bare dummy substrate, or the substrate-shaped object using the rinsing liquid, the at least one component being selected from the group consisting of;

an edge seal member, a sensor, a positioning device, and a mirror element.

9. A method according to claim 8, wherein said at least part of the apparatus comprises at least part of the substrate holder.

10. A method according to claim 8, wherein said rinsing includes rinsing at least one slit or aperture extending in or near the substrate holder.

11. A method according to claim 8, wherein the substrate to be illuminated that replaces the bare substrate, the bare dummy substrate, or the substrate-shaped object is a first substrate of a batch of substrates to be illuminated by the projected beam of radiation of the projection system, and wherein the method further comprises illuminating each substrate in the batch of substrates using the projection system.

12. An immersion lithographic apparatus comprising:

at least one immersion space extending at least between at least part of a bare substrate, a bare dummy substrate, a substrate-shaped object or a substrate holder on one side, and a projection system on an opposite side; and

an immersion system configured to at least partially fill the immersion space with an immersion liquid,

wherein the apparatus is configured to place the bare substrate, the bare dummy substrate, or the substrate-shaped object on the substrate holder, rinse at least part of the immersion space with the rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate to prevent or reduce contamination of the immersion lithographic apparatus, and replace the bare substrate, the bare dummy substrate, or the substrate-shaped object with the substrate before illumination by the projected beam of radiation of the projection system,

wherein the apparatus is configured to rinse at least part of a surface of the substrate holder surrounding the bare substrate, the bare dummy substrate, or the substrate-shaped object and at least one component that is located on the surface of the substrate holder surrounding the bare substrate, the bare dummy substrate, or the substrate-shaped object using said immersion space and said rinsing liquid, the at least one component being selected from the group consisting of;

an edge seal member, a sensor, a positioning device, and a mirror element, by moving said substrate holder with respect to said projection system during the rinsing.

13. An apparatus according to claim 12, wherein the apparatus is configured to rinse at least part of the immersion space during an idle operational mode of the apparatus.

14. An apparatus according to claim 12, wherein the apparatus is configured to provide an object in said immersion space or in an adjoining position with respect to the immersion space during the rinsing of that space, and to remove said object before the apparatus is used to project a radiation beam onto a target portion of a substrate.

15. An apparatus according to claim 14, further comprising at least one storage space or compartment to store said object when the apparatus is used to project a radiation beam onto a target portion of the substrate.

16. An apparatus according to claim 12, wherein the apparatus is configured to rinse the immersion space with said immersion liquid.

17. An apparatus according to claim 12, wherein the apparatus is configured to rinse the immersion space substantially continuously until the apparatus projects a radiation beam onto a substrate.

18. An apparatus according to claim 12, further comprising at least one ultra violet radiation source configured to illuminate the immersion space with ultraviolet radiation during the rinsing of that space, before the apparatus is used to project the beam of radiation onto a target portion of a substrate.

19. An apparatus according to claim 12, wherein said apparatus is configured to have the immersion space at least reach or include an outer contour of the bare substrate, the bare dummy substrate or the substrate-shaped object, being held by said substrate holder, during the rinsing.

20. An apparatus according to claim 12, wherein the apparatus is configured to rinse at least an area extending along an edge of the bare substrate, the bare dummy substrate or a substrate-shaped object, being held by the substrate holder, using said immersion space and said rinsing liquid.

21. An apparatus according to claim 12, further comprising at least two substrate holders, wherein said immersion space extends between at least part of at least one of the substrate holders on one side and a projection system on an opposite side, and wherein the apparatus is configured to move each substrate holder to a first position and to a respective second position, away from said projection system.

22. An apparatus according to claim 21, wherein the apparatus is configured to subsequently move said substrate holders to said first position, to be at least partially rinsed in or near that position by said rinsing liquid.

23. An apparatus according to claim 21, further comprising at least one cleaning device configured to at least partially clean at least one of the substrate holders when that substrate holder is in said second position.

24. An apparatus according to claim 21, wherein the apparatus is configured to determine which of said substrate holders is most likely to be contaminated and to rinse or clean the substrate holder that has been found to be most likely contaminated, first.

25. An apparatus according to claim 12, wherein the apparatus is configured to start said rinsing automatically after a predetermined amount of idle time of the apparatus.

26. An apparatus according to claim 12, wherein the apparatus is configured to start said rinsing automatically after a predetermined number of substrate exposures.

27. An apparatus according to claim 12, wherein the apparatus is configured to determine or estimate whether at least part of said apparatus has reached a certain threshold amount of contamination, and to rinse said apparatus part when it has been determined or estimated that said apparatus part has reached the threshold amount of contamination.

28. An apparatus according to claim 12, further comprising a computer control to control said rinsing.

29. The apparatus according to claim 12, wherein the substrate to be illuminated that replaces the bare substrate, the bare dummy substrate, or the substrate-shaped object is a first substrate of a batch of substrates the to be illuminated by the projected beam of radiation of the projection system, and wherein the apparatus is configured to illuminate each substrate in the batch of substrates using the projection system.