Radiation system with contamination barrier
First Claim
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1. A radiation system comprising:
- a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source, the contamination barrier comprising a plurality of lamellas, the surface of the lamellas comprising a material; and
a collector configured to collect radiation from the contamination barrier, an optical surface of the collector comprising a material that is the same as the material of the surface of the lamellas.
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Abstract
A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
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Citations
3 Claims
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1. A radiation system comprising:
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a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source, the contamination barrier comprising a plurality of lamellas, the surface of the lamellas comprising a material; and a collector configured to collect radiation from the contamination barrier, an optical surface of the collector comprising a material that is the same as the material of the surface of the lamellas.
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2. A lithographic projection apparatus comprising:
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a radiation system to form a beam of radiation, the radiation system comprising; a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source, the contamination barrier comprising a plurality of lamellas, the surface of the lamellas comprising a material, and a collector configured to collect radiation from the contamination barrier, an optical surface of the collector comprising a material that is the same as the material of the surface of the lamellas; a support structure to support a patterning structure to be irradiated by a beam of radiation to pattern the beam of radiation; a substrate support to support a substrate; and a projection system to image an irradiated portion of the patterning structure onto a target portion of the substrate.
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3. A method of manufacturing a device by a lithographic process, the method comprising:
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passing radiation from a radiation source through a contamination barrier comprising a plurality of lamellas, the surface of the lamellas comprising a material and the contamination barrier capturing debris from the radiation source; collecting radiation from the contamination barrier with a collector, an optical surface of the collector comprising a material that is the same as the material of the surface of the lamellas; patterning radiation from the collector; and projecting the patterned radiation onto a target portion of a substrate.
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Specification