Exposure apparatus, exposure method, and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
- a projection optical system which projects the image of the pattern onto the substrate;
a substrate stage which is movable and which holds the substrate;
a first detecting system which detects an alignment mark on the substrate held by the substrate stage and which detects a reference provided on the substrate stage; and
a second detecting system which detects the reference provided on the substrate stage via the projection optical system, wherein;
the reference includes a first reference and a second reference, and the first reference is detected not through the liquid by using the first detecting system and the second reference is detected via the projection optical system and the liquid by using the second detecting system to determine a positional relationship between a detection reference position of the first detecting system and a projection position of the image of the pattern.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.
150 Citations
72 Claims
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1. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage which is movable and which holds the substrate; a first detecting system which detects an alignment mark on the substrate held by the substrate stage and which detects a reference provided on the substrate stage; and a second detecting system which detects the reference provided on the substrate stage via the projection optical system, wherein; the reference includes a first reference and a second reference, and the first reference is detected not through the liquid by using the first detecting system and the second reference is detected via the projection optical system and the liquid by using the second detecting system to determine a positional relationship between a detection reference position of the first detecting system and a projection position of the image of the pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 13, 14)
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10. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate through the liquid covering only a portion of a surface of the substrate; a substrate stage which has a substrate holder to hold the substrate and which is movable; a first detecting system which detects an alignment mark on the substrate held by the substrate holder; and a second detecting system which detects a reference provided on the substrate stage through the liquid, the reference being arranged away from the substrate holder, wherein; a dummy substrate is arranged on the substrate holder when the reference provided on the substrate stage is detected through the liquid by using the second detecting system. - View Dependent Claims (15, 16, 17, 18, 19)
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20. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a reference member which has an upper surface having no difference in level, at least a part of the upper surface being liquid-repellent; and a detecting system which detects a reference formed on the reference member in a state in which a space between an end surface of the projection optical system and the upper surface of the reference member is filled with the liquid. - View Dependent Claims (21, 22, 23)
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24. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage which has a substrate holder to hold the substrate and which is movable; a detector which detects whether or not the substrate or a dummy substrate is held by the substrate holder; and a control unit which changes a movable area of the substrate stage depending on a detection result obtained by the detector. - View Dependent Claims (25, 26, 27, 28, 29, 30)
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31. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage which has a substrate holder to hold the substrate and which is movable; a liquid supply system which supplies the liquid; a detector which detects whether or not the substrate or a dummy substrate is held by the substrate holder; and a control unit which controls operation of the liquid supply system on the basis of a detection result obtained by the detector. - View Dependent Claims (32, 33, 34, 35, 36)
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37. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage which has a substrate holder to hold the substrate and which is movable; a liquid supply system which supplies the liquid, and a control unit connected to the substrate stage and the liquid supply system, the control unit controls the liquid supply system to supply the liquid onto the substrate stage under a condition of receiving information that the substrate or a dummy substrate is held by the substrate holder, wherein the dummy substrate is an alternative of the substrate. - View Dependent Claims (38, 39, 40, 41, 42, 43)
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44. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage which is movable; a liquid immersion system which forms a liquid immersion area; and a control unit connected to the substate stage and the liquid immersion area on the substrate stage under a condition of receiving information that the substrate or a dummy substrate is held by the substrate stage, wherein the dummy substrate is an alternative of the substrate. - View Dependent Claims (45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60)
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61. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a stage which is movable on an image plane side of the projection optical system; a first detecting system which detects an alignment mark on the substrate and which detects a first reference provided on the stage; and a second detecting system which detects a second reference provided on the stage via the projection optical system, wherein; the first reference provided on the stage is detected not through the liquid by using the first detecting system, and the second reference provided on the stage is detected via the projection optical system and the liquid by using the second detecting system to determine a positional relationship between a detection reference position of the first detecting system and a projection position of the image of the pattern. - View Dependent Claims (62)
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63. An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid, the exposure method comprising:
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detecting position information about an alignment mark on the substrate by using a first detecting system; detecting position information about a first reference on a substrate stage which holds the substrate, by using the first detecting system; and detecting a second reference on the substrate stage via the projection optical system and the liquid by using a second detecting system after completion of both of detection of the position information about the alignment mark and detection of the position information about the first reference on the substrate stage by the first detecting system, wherein; a relationship between a detection reference position of the first detecting system and a projection position of the image of the pattern is determined on the basis of a detection result of the position information about the alignment mark obtained by the first detecting system, a detection result of the position information about the first reference on the substrate stage obtained by the first detecting system, and a detection result of the position information about the second reference on the substrate stage obtained by the second detecting system, and the image of the pattern and the substrate are relatively moved to successively project the image of the pattern onto each of a plurality of shot areas on the substrate to expose the substrate. - View Dependent Claims (64, 65, 66, 67)
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68. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate; a substrate stage which has a substrate holder to hold the substrate and which is movable; and a control unit connected to the substrate stage, the control unit prohibits formation of a liquid immersion area on the substrate stage under a condition of receiving information that the substrate or a dummy substrate is not held by the holder. - View Dependent Claims (69, 70, 71, 72)
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Specification