Exposure apparatus and method for producing device
First Claim
1. A method used in a liquid immersion exposure apparatus in which a substrate is exposed, the method comprising:
- supplying an exposure liquid from a supply port onto a surface of the substrate to expose the substrate with a patterned beam through the exposure liquid during an exposure operation;
moving a first member, which is different from the substrate, below the supply port; and
supplying the exposure liquid onto a surface of the first member during a cleaning operation.
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Accused Products
Abstract
A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
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Citations
36 Claims
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1. A method used in a liquid immersion exposure apparatus in which a substrate is exposed, the method comprising:
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supplying an exposure liquid from a supply port onto a surface of the substrate to expose the substrate with a patterned beam through the exposure liquid during an exposure operation; moving a first member, which is different from the substrate, below the supply port; and supplying the exposure liquid onto a surface of the first member during a cleaning operation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A liquid immersion exposure apparatus comprising:
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an optical element via which a patterned beam is projected onto a substrate in an exposure operation; a movable member which has a surface and which is different from the substrate, the movable member being movable to a position at which the surface of the member faces the optical element; and a liquid supply system having a supply port from which exposure liquid is supplied, the liquid supply system (i) supplying the exposure liquid from the supply port to a space between the optical element and the substrate during the exposure operation, and (ii) supplying the exposure liquid from the supply port to a space between the optical element and the surface of the member during a cleaning operation in which the movable member is moved to the position at which the surface of the member faces the optical element. - View Dependent Claims (18)
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19. A liquid immersion exposure apparatus in which a substrate is exposed, the apparatus comprising:
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a first member which has a surface, the first member being different from the substrate; a movable stage on which the first member is arranged; and a liquid supply system having a supply port from which an exposure liquid is supplied, the liquid supply system (i) supplying the exposure liquid from the supply port onto a surface of the substrate to expose the substrate with a patterned beam through the exposure liquid during an exposure operation, and (ii) supplying the exposure liquid from the supply port onto the surface of the first member during a cleaning operation. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
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Specification