Film forming apparatus and method, gas supply device and storage medium
First Claim
Patent Images
1. A film forming apparatus comprising:
- a chamber which defines a processing space in which a film forming process is performed on a substrate;
a stage arranged in the chamber on which the substrate is mounted, the stage including a substrate heating unit that heats the substrate;
a shower head which is arranged to face the stage and has a plurality of gas injecting holes;
a gas supply unit that supplies a processing gas into the chamber through the shower head;
a cooling unit arranged above the shower head that cools the shower head; and
a shower head heating unit arranged above the cooling unit that heats the shower head through the cooling unit,wherein the cooling unit includes a plurality of cooling fins and a cooling gas supply channel that supplies cooling gas to the corresponding cooling fins.
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Abstract
A film forming apparatus is provided with a chamber which defines a processing space for performing a film forming process to a substrate a stage arranged in the chamber for mounting the substrate thereon; a substrate heating unit arranged on the stage for heating the substrate; a shower head which is arranged to face the stage and has many gas injecting holes; a gas supply unit for supplying cooling unit arranged above the shower head for cooling the shower head; and a shower head heating unit arranged above the cooling unit for heating the shower head through the cooling unit.
62 Citations
20 Claims
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1. A film forming apparatus comprising:
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a chamber which defines a processing space in which a film forming process is performed on a substrate; a stage arranged in the chamber on which the substrate is mounted, the stage including a substrate heating unit that heats the substrate; a shower head which is arranged to face the stage and has a plurality of gas injecting holes; a gas supply unit that supplies a processing gas into the chamber through the shower head; a cooling unit arranged above the shower head that cools the shower head; and a shower head heating unit arranged above the cooling unit that heats the shower head through the cooling unit, wherein the cooling unit includes a plurality of cooling fins and a cooling gas supply channel that supplies cooling gas to the corresponding cooling fins. - View Dependent Claims (2, 3, 4, 5, 6, 7, 13, 14, 15, 16)
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8. A gas supply device for use in a film forming apparatus including a chamber which defines a processing space for performing film forming process to a substrate and a stage arranged in the chamber for mounting the substrate thereon, the gas supply device comprising:
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a shower head which is arranged to face the stage and has a plurality of gas injecting holes; a cooling unit arranged above the shower head that cools the shower head; and a shower head heating unit arranged above the cooling unit that heats the shower head through the cooling unit, wherein the cooling unit includes a plurality of cooling fins and a cooling gas supply channel that supplies cooling gas to the corresponding cooling fins. - View Dependent Claims (9, 10, 11, 12, 17, 18, 19, 20)
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Specification