Substrate for transparent electrodes

• US 8,133,807 B2
• Filed: 05/01/2008
• Issued: 03/13/2012
• Est. Priority Date: 02/26/2002
• Status: Expired due to Fees

• Current Assignee: Fujikura Limited
• Original Assignee: Fujikura Limited
• Inventors: Kawashima, Takuya, Matsui, Hiroshi, Okada, Kenichi, Tanabe, Nobuo
• Primary Examiner(s): Smoot, Stephen W
• Assistant Examiner(s): Booker, Vicki B
• Application Number:
  US12/113,654
• Publication Number:
  US 20080237760A1
• Time in Patent Office: 1,412 Days
• Field of Search: 438/609, 257/E31.124, 257/E31.126, 257/E21.159
• US Class Current: 438/609
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3452 comprising a fluoride
• CPC Class Codes: H01G 9/2031 comprising titanium oxide, e.g. TiO2 H01G9/2036 takes precedence
• CPC Class Codes: H01L 31/1884 Manufacture of transparent electrodes, e.g. TCO, ITO
• CPC Class Codes: H10K 30/82 Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
• CPC Class Codes: H10K 77/10 Substrates, e.g. flexible substrates
• CPC Class Codes: Y02E 10/542 Dye sensitized solar cells
• CPC Class Codes: Y02E 10/549 Organic PV cells
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product
• CPC Class Codes: Y10T 428/24355 Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
• CPC Class Codes: Y10T 428/24364 with transparent or protective coating
• CPC Class Codes: Y10T 428/2438 Coated
• CPC Class Codes: Y10T 428/24942 including components having same physical characteristic in differing degree

Abstract

One object of the present invention is to provide a transparent electrode substrate with an ITO film formed thereon, used for example as the transparent electrode plate in a dye sensitized solar cell, for which the electrical resistance does not increase even when exposed to high temperatures of 300° C. or higher. In order to achieve the object, the present invention provides a substrate for a transparent electrode, wherein two or more layers of different transparent conductive films are formed on a transparent substrate, and an upper layer transparent conductive film has a higher heat resistance than that of a lower layer transparent conductive film.

Claims

1. A method of producing a substrate for a transparent electrode comprising:

forming an indium tin oxide film on a transparent substrate at 280°

C. or higher by means of a spray pyrolysis deposition method; and

subsequently forming a fluorine doped tin oxide film on the indium tin oxide film by means of a spray pyrolysis deposition method, wherein a raw material compound solution used for forming the fluorine doped tin oxide film is sprayed within 1 to 3 minutes of completing the formation of the indium tin oxide film.

4. The method according to claim 1, wherein the forming of the fluorine doped tin oxide film occurs while a temperature of the transparent substrate is approximately 400°

C.-500°

C.

7. The method according to claim 1, wherein forming the indium tin oxide film on the transparent substrate is at 280°

C.-360°

C. by means of a spray pyrolysis deposition method.

2. A method of producing a substrate for a transparent electrode comprising:

forming an indium tin oxide film on a transparent substrate by means of a spray pyrolysis deposition method; and

subsequently forming a fluorine doped tin oxide film on the indium tin oxide film at a temperature of about 360 to about 440°

C. by means of a spray pyrolysis deposition method, wherein a raw material compound solution used for forming the fluorine doped tin oxide film is sprayed within 1 to 3 minutes of completing the formation of the indium tin oxide film.

5. The method according to claim 2, wherein the forming of the fluorine doped tin oxide film occurs while a temperature of the transparent substrate is approximately 400°

C.-500°

C.

8. The method according to claim 2, wherein forming the indium tin oxide film on the transparent substrate is at 280°

C.-360°

C. by means of a spray pyrolysis deposition method.

3. A method of producing a substrate for a transparent electrode comprising:

forming an indium tin oxide film on a transparent substrate at 280°

C. or higher by means of a spray pyrolysis deposition method; and

subsequently forming a fluorine doped tin oxide film on the indium tin oxide film at a temperature of about 360 to about 440°

C. by means of a spray pyrolysis deposition method, wherein a raw material compound solution used for forming the fluorine doped tin oxide film is sprayed within 1 to 3 minutes of completing the formation of the indium tin oxide film.

6. The method according to claim 3, wherein the forming of the fluorine doped tin oxide film occurs while a temperature of the transparent substrate is approximately 400°

C.-500°

C.

9. The method according to claim 3, wherein forming the indium tin oxide film on the transparent substrate is at 280°

C.-360°

C. by means of a spray pyrolysis deposition method.