Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
First Claim
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1. A liquid recovery system that is used in an immersion exposure apparatus, comprising:
- a first surface and a second surface on the side opposite the first surface, an object opposing the first surface being moved relative to the first surface below the first surface;
a liquid recovery part, at least a part of which opposes the second surface with a first gap interposed therebetween, gas being prevented from being recovered from the liquid recovery part;
a first opening which is connected with the first gap and through which liquid on the object flows into the first gap, the liquid in the gap being recovered via the liquid recovery part; and
a second opening different from the first opening, through which gas flows from the first gap, the second opening being located higher than the liquid recovery part and the second opening being located such that the liquid is prevented from flowing to the second opening.
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Abstract
A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.
66 Citations
67 Claims
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1. A liquid recovery system that is used in an immersion exposure apparatus, comprising:
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a first surface and a second surface on the side opposite the first surface, an object opposing the first surface being moved relative to the first surface below the first surface; a liquid recovery part, at least a part of which opposes the second surface with a first gap interposed therebetween, gas being prevented from being recovered from the liquid recovery part; a first opening which is connected with the first gap and through which liquid on the object flows into the first gap, the liquid in the gap being recovered via the liquid recovery part; and a second opening different from the first opening, through which gas flows from the first gap, the second opening being located higher than the liquid recovery part and the second opening being located such that the liquid is prevented from flowing to the second opening. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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29. An immersion exposure apparatus that exposes a substrate, comprising:
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an optical member that comprises an emergent surface from which exposure light is emitted; and an immersion member which includes; the first surface, an object opposing the first surface being moved relative to the first surface below the first surface, a second surface on the side opposite the first surface; a liquid recovery part, at least a part of which opposes the second surface with a first gap interposed therebetween; a first opening which is connected with the first gap and through which liquid on the object flows into the first gap, the liquid in the gap being recovered via the liquid recovery part; and a second opening different from the first opening, through which gas flows from the first gap, the second opening being located higher than the liquid recovery part and the second opening being located such that the liquid is prevented from flowing to the second opening. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64)
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65. An immersion exposing method that exposes a substrate, the method comprising:
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exposing the substrate with exposure light through a liquid on the substrate; and recovering the liquid on the substrate using a liquid recovery system during the exposure of the substrate; wherein, the liquid recovery system comprises; a first surface and a second surface on the side opposite the first surface, an object opposing the first surface being moved relative to the first surface below the first surface; and a liquid recovery part that is disposed so that at least a part of the liquid recovery part opposes the second surface with a first gap interposed therebetween; a first opening which is connected with the first gap and through which liquid on the object flows into the first gap, the liquid in the gap being recovered via the liquid recovery part; and a second opening different from the first opening, through which gas flows from the first gap, the second opening being located higher than the liquid recovery part and the second opening being located such that the liquid is prevented from flowing to the second opening. - View Dependent Claims (66, 67)
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Specification
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Current AssigneeNikon Corporation
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Original AssigneeNikon Corporation
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InventorsNishii, Yasufumi, Nagasaka, Hiroyuki, Okuyama, Takeshi
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Primary Examiner(s)NGUYEN, HUNG
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Application NumberUS12/076,331Publication NumberTime in Patent Office1,457 DaysField of Search355/30, 355/53, 355/72, 355/77, 250/548US Class Current355/53CPC Class CodesG03F 7/70341 Details of immersion lithog...
