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Three dimensional integrated circuits and methods of fabrication

  • US 8,136,071 B2
  • Filed: 09/12/2008
  • Issued: 03/13/2012
  • Est. Priority Date: 09/12/2007
  • Status: Expired due to Fees
First Claim
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1. A three dimensional (3D) integrated circuit (IC) which is formed by organizing semiconductor integrated circuits into a multi-layer IC with through silicon vias (TSVs), comprising:

  • logic or memory circuits configured on circuit layers;

    TSVs, connecting adjacent circuit layers;

    wherein two or more circuit layers of ICs are connected with contiguous TSVs;

    wherein electronic signals are transmitted through the TSVs from an IC on one layer of the multi-layer IC to other circuit layers;

    wherein each circuit layer of the multi-layer IC contains individual tiles on which are structured logic or memory circuits;

    wherein when at least two tiles on a same circuit layer of the multi-layer IC are connected, the tiles are connected by interconnects; and

    wherein the multi-layer IC performs specific computational tasks.

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