Systems and methods for the manufacture of flat panel devices
First Claim
1. A method for the manufacture of an active matrix backplane, comprising:
- electrographically forming a first conductive layer comprising a set of conductive portions on an insulating substrate;
forming a cross-over dielectric by a process selected from an electrographic process and a raster deposition process, at least a portion of the cross-over dielectric being formed on at least a portion of the first conductive layer;
forming a second conductive layer by a process selected from an electrographic process and a raster deposition process, at least a portion of the second conductive layer being formed on at least a portion of the cross-over dielectric formed on at least a portion of the first conductive layer; and
forming an active matrix backplane functional device comprising a semiconducting material portion, a gate dielectric, and a gate electrode by a raster deposition process, the functional device being electrically connected to at least one of the first conductive layer and the second conductive layer.
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Abstract
A backplane having a circuit array having at least one region comprising a substrate having a conductive plane under a dielectric surface, a first conductive layer on said dielectric surface, a selectively disposed insulator disposed over said first conductive layer, and a second conductive layer disposed on said insulator, wherein said first conductive layer is electrically insulated from said second conductive layer, said first conductive layer being formed electrographically, and said second conductive layer being formed by a process comprising selective deposition of liquid droplets, which are then solidified. The second conductive layer may be formed electrographically or by a raster deposition process. The backplane preferably forms an active matrix for a flat panel display using organic semiconductor active elements.
315 Citations
22 Claims
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1. A method for the manufacture of an active matrix backplane, comprising:
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electrographically forming a first conductive layer comprising a set of conductive portions on an insulating substrate; forming a cross-over dielectric by a process selected from an electrographic process and a raster deposition process, at least a portion of the cross-over dielectric being formed on at least a portion of the first conductive layer; forming a second conductive layer by a process selected from an electrographic process and a raster deposition process, at least a portion of the second conductive layer being formed on at least a portion of the cross-over dielectric formed on at least a portion of the first conductive layer; and forming an active matrix backplane functional device comprising a semiconducting material portion, a gate dielectric, and a gate electrode by a raster deposition process, the functional device being electrically connected to at least one of the first conductive layer and the second conductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method for manufacturing an active matrix device, comprising:
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electrographically forming a first conductive array pattern on an insulating substrate; forming a dielectric array pattern over portions of the first conductive array pattern, by a process selected from an electrographic process and a raster deposition process; forming a second conductive array pattern over at least portions of the dielectric array pattern by a process selected from an electrographic process and a raster deposition process; forming an array of functional devices, each comprising a channel material portion, and a gate portion, by a raster deposition process; wherein a channel material of a respective functional device of the array of functional devices is selectively modulated based on signals in the first and second conductive arrays. - View Dependent Claims (21)
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22. A method of forming an active matrix display device, comprising an array of rows and columns, having at each junction a cross-over dielectric separating the respective row and column electrodes, an active modulator selectively responsive to electrical signals in the row and column electrodes, and an electrically modulated optical composition, the method comprising:
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electrographically forming a column conductive array pattern on an insulating substrate; forming a cross-over dielectric array pattern over portions of the column conductive array pattern, by a process selected from an electrographic process and a raster deposition process; forming a row conductive array pattern over at least portions of the dielectric array pattern by a process selected from an electrographic process and a raster deposition process; forming an array of active modulators, each comprising a channel material portion, and a gate portion, by a raster deposition process, proximate to each junction; and depositing the electrically modulated optical composition configured to be selectively spatially modulated by the array of active modulators dependent on electrical signals in the column conductive array pattern and the row conductive array pattern.
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Specification