Heating device for heating semiconductor wafers in thermal processing chambers
First Claim
1. An apparatus for heat treating semiconductor wafers comprising:
- a thermal processing chamber adapted to contain a semiconductor wafer;
a heating device in communication with the thermal processing chamber for heating a semiconductor wafer in the chamber, the heating device comprising a plurality of light energy sources configured to emit light energy onto the semiconductor wafer; and
at least one tuning device near one or more light energy sources, the tuning device comprising a passive optical element, the optical element comprising(i) a diffusing surface that scatters light energy in multiple directions and is configured to redirect only a portion of the light energy being emitted by the light energy sources;
or(ii) a surface containing a plurality of facets that is configured to redirect light energy being emitted by at least one of the light energy sources.
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Accused Products
Abstract
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. The light energy sources can be placed in various configurations. In accordance with the present invention, tuning devices which are used to adjust the overall irradiance distribution of the light energy sources are included in the heating device. The tuning devices can be either active sources of light energy or passive sources which reflect, refract or absorb light energy. For instance, in one embodiment, the tuning devices can comprise a lamp spaced from a focusing lens designed to focus determined amounts of light energy onto a particular location of a wafer being heated.
232 Citations
27 Claims
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1. An apparatus for heat treating semiconductor wafers comprising:
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a thermal processing chamber adapted to contain a semiconductor wafer; a heating device in communication with the thermal processing chamber for heating a semiconductor wafer in the chamber, the heating device comprising a plurality of light energy sources configured to emit light energy onto the semiconductor wafer; and at least one tuning device near one or more light energy sources, the tuning device comprising a passive optical element, the optical element comprising (i) a diffusing surface that scatters light energy in multiple directions and is configured to redirect only a portion of the light energy being emitted by the light energy sources;
or(ii) a surface containing a plurality of facets that is configured to redirect light energy being emitted by at least one of the light energy sources. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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Specification