Exposure apparatus, exposure method, and method for producing device

• US 8,139,198 B2
• Filed: 04/14/2006
• Issued: 03/20/2012
• Est. Priority Date: 09/29/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Nishinaga, Hisashi, Hikima, Ikuo, Toyoda, Mitsunori, Hagiwara, Tsuneyuki, Mizuno, Yasushi, Kita, Naonori, Tanitsu, Osamu, Nakagawa, Masahiro, Emura, Nozomu
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US11/403,922
• Publication Number:
  US 20060181690A1
• Time in Patent Office: 2,167 Days
• Field of Search: 355/53, 355/30, 355/72, 355/75, 355/55, 428/446, 359/380, 359/886, 210/188, 210/321.6, 210/650
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/7015 Details of optical elements
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Claims

1. A measuring system for the optical measurement of an optical imaging system which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, the imaging system being designed as an immersion system for imaging with the aid of an immersion liquid arranged on an image-side of the imaging system, comprising:

at least one chassis having a measuring unit, the chassis being provided to be arranged in a region of the immersion liquid, the chassis having a light transmitting section which is covered by a plate that is transparent to measuring radiation in order to protect the measuring unit from the immersion liquid, wherein the plate is provided with a protective member between the plate and the chassis and, during the measurement, the plate is arranged between the measuring unit and the immersion liquid.

2. The measuring system as claimed in claim 1, further comprising:

a detector which obtains data based on light received through the optical imaging system and the measuring unit.

3. The measuring system as claimed in claim 1, wherein a light shielding section is applied to at least one surface of the plate, the light shielding section covering all but a central portion of the plate so as to restrict light that is transmitted to a detector.

4. The measuring system as claimed in claim 3, wherein the light shielding section consists of a metal.

5. The measuring system as claimed in claim 3, wherein the light transmitting section is configured such that the light shielding section is enclosed by a substrate and the plate in a manner which is substantially liquid-tight on all sides.

6. The measuring system as claimed in claim 1, wherein the plate is a component that is separate from the chassis and which is fitted between the measuring unit and the immersion liquid.

7. The measuring system as claimed in claim 1, wherein the plate comprises a plane-parallel plate.

8. A chassis for a measuring system for the optical measurement of an optical imaging system, the chassis having at least one measuring unit, the chassis having a light transmitting section which is covered by a plate that is transparent to measuring radiation in order to protect the measuring unit from immersion liquid, wherein the plate is provided with a protective member between the plate and the chassis and the plate is arranged over the measuring unit.

9. The chassis as claimed in claim 8, wherein the measuring unit comprises a pinhole.

10. The chassis as claimed in claim 8, wherein the plate comprises a plane-parallel plate.

11. A chassis for a measuring system for the optical measurement of an optical imaging system, the chassis having an aperture structure, which is covered by a plate that is transparent to measuring radiation in order to protect the aperture structure from immersion liquid, wherein the plate is provided with a protective member between the plate and the chassis and the plate is arranged over the aperture structure.

12. The chassis as claimed in claim 11, wherein the plate comprises a plane-parallel plate.