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Exposure apparatus, exposure method, and method for producing device

  • US 8,139,198 B2
  • Filed: 04/14/2006
  • Issued: 03/20/2012
  • Est. Priority Date: 09/29/2003
  • Status: Expired due to Fees
First Claim
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1. A measuring system for the optical measurement of an optical imaging system which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, the imaging system being designed as an immersion system for imaging with the aid of an immersion liquid arranged on an image-side of the imaging system, comprising:

  • at least one chassis having a measuring unit, the chassis being provided to be arranged in a region of the immersion liquid, the chassis having a light transmitting section which is covered by a plate that is transparent to measuring radiation in order to protect the measuring unit from the immersion liquid, wherein the plate is provided with a protective member between the plate and the chassis and, during the measurement, the plate is arranged between the measuring unit and the immersion liquid.

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