Alignment systems and methods for lithographic systems

• US 8,139,217 B2
• Filed: 12/23/2010
• Issued: 03/20/2012
• Est. Priority Date: 09/20/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Bilsen, Franciscus Bernardus Maria, Burghoorn, Jacobus, Van Haren, Richard Johannes Franciscus, Hinnen, Paul Christiaan, Van Horssen, Hermanus Gerardus, Huijbregtse, Jeroen, Jeunink, Andre Bernardus, Megens, Henry, Koren, Ramon Navarro Y, Tolsma, Hoite Pieter Theodoor, Simons, Hubertus Johannes Gertrudus, Schuurhuis, Johny Rutger, Schets, Sicco Ian, Lee, Brian Young Bok, Dunbar, Allan Reuben
• Primary Examiner(s): Chowdhury, Tarifur
• Assistant Examiner(s): Stock, Jr., Gordon
• Application Number:
  US12/977,541
• Publication Number:
  US 20110128520A1
• Time in Patent Office: 453 Days
• Field of Search: None
• US Class Current: 356/399
• CPC Class Codes: G03F 9/7046 Strategy, e.g. mark, sensor or wavelength selection
• CPC Class Codes: G03F 9/7049 Technique, e.g. interferometric
• CPC Class Codes: G03F 9/7076 Mark details, e.g. phase grating mark, temporary mark
• CPC Class Codes: G03F 9/7084 Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
• CPC Class Codes: G03F 9/7092 Signal processing

Abstract

An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Claims

1. An alignment method in a lithographic apparatus, the method comprising:

illuminating an alignment mark provided on a substrate with a radiation beam, the alignment mark including a first grating and a second grating that are each adapted to enhance a different diffraction order, each of the first and the second grating including a plurality of segments alternately repeated along a first direction, wherein at least one segment of each of the first and the second grating is divided to form sub-segments that are alternately repeated along a second direction that is different from the first direction;

detecting a signal resulting from an interaction between the alignment mark and the radiation beam; and

aligning the substrate in the lithographic apparatus based on the detected signal.

2. The method of claim 1, wherein each segment of each of the first and the second grating is divided to form sub-segments that are alternately repeated along the second direction.

3. The method of claim 1, wherein the illuminating includes scanning the radiation beam over the first and the second grating.

4. The method of claim 1, wherein the alignment mark comprises a third grating that is adapted to enhance a diffraction order that is different from the diffraction orders enhanced by the first and the second grating, wherein the third grating includes a plurality of segments alternately repeated along the first direction, wherein at least one segment of the third grating is divided to form sub-segments that are alternately repeated along the second direction.

5. The method of claim 1, wherein the alignment mark is formed in a metal layer on the substrate and dimensions of the segments of the first and second gratings are selected based on a thickness variation of said metal layer on said substrate.

6. The method of claim 4, comprising determining an alignment signal for each of the first, second and third gratings and comparing the alignment signal of the first grating with the alignment signals of the second and third gratings.

7. The method of claim 5, wherein the metal is tungsten or aluminum.

8. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a substrate; and

aligning the substrate so that the patterned beam of radiation is projected at desired locations on the substrate, the aligning comprising

illuminating an alignment mark provided on the substrate with a radiation beam, the alignment mark including a first grating and a second grating that are each adapted to enhance a different diffraction order, each of the first and the second grating including a plurality of segments alternately repeated along a first direction, wherein at least one segment of each of the first and the second grating is divided to form sub-segments that are alternately repeated along a second direction that is different from the first direction; and

detecting a signal resulting from an interaction between the alignment mark and the radiation beam.

9. The method of claim 8, wherein each segment of each of the first and the second grating is divided to form sub-segments that are alternately repeated along the second direction.

10. The method of claim 8, wherein the illuminating includes scanning the radiation beam over the first and the second grating.

11. The method of claim 8, wherein the alignment mark comprises a third grating that is adapted to enhance a diffraction order that is different from the diffraction orders enhanced by the first and the second grating, wherein the third grating includes a plurality of segments alternately repeated along the first direction, wherein at least one segment of the third grating is divided to form sub-segments that are alternately repeated along the second direction.

12. The method of claim 8, wherein the alignment mark is formed in a metal layer on the substrate and dimensions of the segments of the first and second gratings are selected based on a thickness variation of said metal layer on said substrate.

13. The method of claim 11, comprising determining an alignment signal for each of the first, second and third gratings and comparing the alignment signal of the first grating with the alignment signals of the second and third gratings.

14. The method of claim 12, wherein the metal is tungsten or aluminum.

15. A lithographic apparatus comprising:

a patterning device support configured to support a patterning device, the patterning device adapted to pattern a beam of radiation to form a patterned beam of radiation;

a substrate table configured to support a substrate;

a projection system configured to project the patterned beam of radiation onto the substrate; and

an alignment system configured to align the substrate in the lithographic apparatus, the alignment system comprising

a source of radiation configured to illuminate an alignment mark provided on the substrate with a radiation beam, the alignment mark including a first grating and a second grating that are each adapted to enhance a different diffraction order, each of the first and the second grating including a plurality of segments alternately repeated along a first direction, wherein at least one segment of each of the first and the second grating is divided to form sub-segments that are alternately repeated along a second direction that is different from the first direction, and

a first and a second detection channel, the first detection channel adapted to detect a signal resulting from an interaction between the first grating and the radiation beam and the second detection channel adapted to detect a signal resulting from an interaction between the second grating and the radiation beam.

16. The apparatus of claim 15, wherein each segment of each of the first and the second grating is divided to form sub-segments that are alternately repeated along the second direction.

17. The apparatus of claim 15, wherein the alignment system comprises a third detection channel adapted to detect a signal resulting from an interaction between a third grating formed in the alignment mark and the radiation beam, the third grating adapted to enhance a diffraction order that is different from the diffraction orders enhanced by the first and the second grating, wherein the third grating includes a plurality of segments alternately repeated along the first direction, wherein at least one segment of the third grating is divided to form sub-segments that are alternately repeated along the second direction.

18. The apparatus of claim 17, wherein the alignment system is adapted to determine an alignment signal for each of the first, second and third gratings and to compare the alignment signal of the first grating with the alignment signals of the second and third gratings to align the substrate.