Apparatus for depositing a uniform silicon film and methods for manufacturing the same
First Claim
1. An apparatus for depositing films suitable for solar cell applications, comprising:
- a processing chamber;
a substrate support disposed in the processing chamber and configured to support a quadrilateral substrate thereon; and
a gas distribution plate disposed in the processing chamber above the substrate support, wherein a bottom surface of the gas distribution plate has a perimeter that includes edges and corners, and wherein the corners of the gas distribution plate are closer to the substrate support than each of the edges of the gas distribution plate, wherein the corners of the gas distribution plate are configured to deposit a silicon film having an increased crystal volume at corners of deposited silicon film.
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Accused Products
Abstract
Methods and apparatus having a gradient spacing created between a substrate support assembly and a gas distribution plate for depositing a silicon film for solar cell applications are provided. In one embodiment, an apparatus for depositing films for solar cell applications may include a processing chamber, a substrate support disposed in the processing chamber and configured to support a quadrilateral substrate thereon, and a gas distribution plate disposed in the processing chamber above the substrate support, wherein a bottom surface of the gas distribution plate has a perimeter that includes edges and corners, and wherein the corners of the gas distribution plate are closer to the substrate support than the edges of the gas distribution plate.
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Citations
12 Claims
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1. An apparatus for depositing films suitable for solar cell applications, comprising:
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a processing chamber; a substrate support disposed in the processing chamber and configured to support a quadrilateral substrate thereon; and a gas distribution plate disposed in the processing chamber above the substrate support, wherein a bottom surface of the gas distribution plate has a perimeter that includes edges and corners, and wherein the corners of the gas distribution plate are closer to the substrate support than each of the edges of the gas distribution plate, wherein the corners of the gas distribution plate are configured to deposit a silicon film having an increased crystal volume at corners of deposited silicon film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An apparatus for depositing films suitable for solar cell applications, comprising:
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a processing chamber; a substrate support disposed in the processing chamber and configured to support a quadrilateral substrate thereon; and a gas distribution plate disposed in the processing chamber above the substrate support, wherein a bottom surface of the gas distribution plate has a perimeter that includes edges and corners, and wherein each of the edges of the gas distribution plate are concave wherein the corners of the gas distribution plate are configured to deposit a silicon film having an increased crystal volume at corners of deposited silicon film. - View Dependent Claims (11, 12)
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Specification