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Apparatus for depositing a uniform silicon film and methods for manufacturing the same

  • US 8,142,606 B2
  • Filed: 06/07/2007
  • Issued: 03/27/2012
  • Est. Priority Date: 06/07/2007
  • Status: Expired due to Fees
First Claim
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1. An apparatus for depositing films suitable for solar cell applications, comprising:

  • a processing chamber;

    a substrate support disposed in the processing chamber and configured to support a quadrilateral substrate thereon; and

    a gas distribution plate disposed in the processing chamber above the substrate support, wherein a bottom surface of the gas distribution plate has a perimeter that includes edges and corners, and wherein the corners of the gas distribution plate are closer to the substrate support than each of the edges of the gas distribution plate, wherein the corners of the gas distribution plate are configured to deposit a silicon film having an increased crystal volume at corners of deposited silicon film.

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