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Lithographically patterned nanowire electrodeposition

  • US 8,142,984 B2
  • Filed: 08/21/2007
  • Issued: 03/27/2012
  • Est. Priority Date: 08/24/2006
  • Status: Active Grant
First Claim
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1. A method for forming metal nanowires comprising the steps ofdepositing a metal electrode layer on an insulator substrate,depositing a layer of photoresist on the metal electrode layer,photo lithographically patterning the photoresist exposing portions of the metal electrode layer,stripping the exposed portion of metal layer from the substrate and forming a trench defined by the photoresist, the substrate and the metal electrode layer, andelectrodepositing a metal nanowire at the metal electrode layer within the trench.

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