Method for forming resist pattern, method for producing circuit board, and circuit board
First Claim
1. A method for producing a circuit board, comprising the steps of:
- (a) preparing an insulating substrate having a through-hole(s), which has a first conductive layer on a first surface, on a second surface opposite to the first surface and on an inner wall of the through-holes(s);
(b) covering the first conductive layer and an opening of the through-hole(s) on the first surface with a photocrosslinkable resin layer and a mask layer by forming the photocrosslinkable resin layer and the mask layer on the first surface;
(c) uncovering the first conductive layer on the periphery of the through-hole(s) on the first surface by supplying a photocrosslinkable resin layer removing solution from the second surface and removing the photocrosslinkable resin layer on the through-hole(s) and on a periphery of the through-hole(s) on the first surface;
(d) subjecting the photocrosslinkable resin layer on the first surface to pattern exposure;
(e) covering the first conductive layer and an opening of the through-hole(s) on the second surface with a photocrosslinkable resin layer and a mask layer by forming the photocrosslinkable resin layer and the mask layer on the second surface;
(f) removing the mask layer on the first surface;
(g) uncovering the first conductive layer on the first surface and the first conductive layer on a periphery of the through-hole(s) on the second surface by supplying a photocrosslinkable resin layer removing solution from the first surface and removing an uncured photocrosslinkable resin layer on the first surface and the photocrosslinkable resin layer on the through-hole(s) and on the periphery of the through-hole(s) on the second surface;
(h) subjecting the photocrosslinkable resin layer on the second surface to pattern exposure;
(i) removing the mask layer on the second surface;
(j) uncovering the first conductive layer on the second surface by supplying a photocrosslinkable resin layer removing solution from the second surface and removing an uncured photocrosslinkable resin layer on the second surface;
(k) forming a second conductive layer on the first conductive layer uncovered on the inner wall of the through-hole(s) and the periphery of the through-hole(s) and on the first surface and the second surface by electrolytic plating;
(l) uncovering the first conductive layer on the first surface and the second surface by removing the cured photocrosslinkable resin layers on the first surface and the second surface; and
(m) removing the uncovered first conductive layer by flash etching.
1 Assignment
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Accused Products
Abstract
There are provided a method for forming a resist pattern for preparing a circuit board having a landless or small-land-width through-hole(s) to realize a high-density circuit board, a method for producing a circuit board, and a circuit board. A method for forming a resist pattern, comprising the steps of forming a resin layer and a mask layer on a first surface of a substrate having a through-hole(s), and removing the resin layer on the through-hole(s) and on a periphery of the through-hole(s) on the first surface by supplying a resin layer removing solution from a second surface opposite to the first surface of the substrate, and a method for producing a circuit board using the method for forming a resist pattern, and a circuit board.
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Citations
4 Claims
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1. A method for producing a circuit board, comprising the steps of:
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(a) preparing an insulating substrate having a through-hole(s), which has a first conductive layer on a first surface, on a second surface opposite to the first surface and on an inner wall of the through-holes(s); (b) covering the first conductive layer and an opening of the through-hole(s) on the first surface with a photocrosslinkable resin layer and a mask layer by forming the photocrosslinkable resin layer and the mask layer on the first surface; (c) uncovering the first conductive layer on the periphery of the through-hole(s) on the first surface by supplying a photocrosslinkable resin layer removing solution from the second surface and removing the photocrosslinkable resin layer on the through-hole(s) and on a periphery of the through-hole(s) on the first surface; (d) subjecting the photocrosslinkable resin layer on the first surface to pattern exposure; (e) covering the first conductive layer and an opening of the through-hole(s) on the second surface with a photocrosslinkable resin layer and a mask layer by forming the photocrosslinkable resin layer and the mask layer on the second surface; (f) removing the mask layer on the first surface; (g) uncovering the first conductive layer on the first surface and the first conductive layer on a periphery of the through-hole(s) on the second surface by supplying a photocrosslinkable resin layer removing solution from the first surface and removing an uncured photocrosslinkable resin layer on the first surface and the photocrosslinkable resin layer on the through-hole(s) and on the periphery of the through-hole(s) on the second surface; (h) subjecting the photocrosslinkable resin layer on the second surface to pattern exposure; (i) removing the mask layer on the second surface; (j) uncovering the first conductive layer on the second surface by supplying a photocrosslinkable resin layer removing solution from the second surface and removing an uncured photocrosslinkable resin layer on the second surface; (k) forming a second conductive layer on the first conductive layer uncovered on the inner wall of the through-hole(s) and the periphery of the through-hole(s) and on the first surface and the second surface by electrolytic plating; (l) uncovering the first conductive layer on the first surface and the second surface by removing the cured photocrosslinkable resin layers on the first surface and the second surface; and (m) removing the uncovered first conductive layer by flash etching. - View Dependent Claims (2, 3, 4)
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Specification