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Two-step hardmask fabrication methodology for silicon waveguides

  • US 8,148,265 B2
  • Filed: 08/29/2008
  • Issued: 04/03/2012
  • Est. Priority Date: 08/29/2008
  • Status: Expired due to Fees
First Claim
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1. A method of making a silicon waveguide structure, the method comprising:

  • depositing a hardmask layer on a substrate having a silicon layer on an oxide layer;

    etching the hardmask layer to provide a patterned hardmask defining patterns for a waveguide and at least one other structure;

    etching partway down the silicon layer with the patterned hardmask in place to form at least part of the waveguide and the at least one other structure;

    patterning a slab of the at least one other structure; and

    etching the remainder of the silicon layer down to the oxide layer with the patterned hardmask in place, thereby defining the slab of the at least one other structure and more of the waveguide.

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