Apparatus and method of improving beam shaping and beam homogenization

• US 8,148,663 B2
• Filed: 07/31/2007
• Issued: 04/03/2012
• Est. Priority Date: 07/31/2007
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Adams, Bruce E., Howells, Samuel C., Jennings, Dean, Li, Jiping, Thomas, Timothy N., Moffatt, Stephen
• Primary Examiner(s): ELVE, MARIA ALEXANDRA
• Application Number:
  US11/888,433
• Publication Number:
  US 20090032511A1
• Time in Patent Office: 1,708 Days
• Field of Search: 219/121.75, 219/121.73, 219/121.76, 219/121.78, 219/121.61
• US Class Current: 219/121.75
• CPC Class Codes: B23K 2103/56 semiconducting semiconducting devices B23K2101/40
• CPC Class Codes: B23K 26/0613 having a common axis B23K26/0619 takes precedence
• CPC Class Codes: B23K 26/0622 by shaping pulses
• CPC Class Codes: B23K 26/067 Dividing the beam into multiple beams, e.g. multifocusing
• CPC Class Codes: B23K 26/073 Shaping the laser spot
• CPC Class Codes: B23K 26/0732 into a rectangular shape
• CPC Class Codes: G02B 27/0961 Lens arrays lens arrays per se G02B3/0006

Abstract

The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

Claims

1. An apparatus for thermally processing a substrate, comprising:

an energy source that has an output and is adapted to deliver a first energy pulse;

a first micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of the first energy pulse;

a second micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of energy transmitted from the first micro-lens array;

a first lens that is positioned to receive the at least a portion of the energy transmitted from the micro lenses in the second micro-lens array and transmit the energy received from the second micro-lens array; and

a second lens that is positioned to receive the at least a portion of the first energy pulse and cause the image received by two or more micro-lenses in the first micro-lens array to be at least partially different, wherein the second lens is a correction lens adapted to improve the uniformity of the at least a portion of the first pulse transmitted by the first lens.

2. The apparatus of claim 1, further comprising a random diffuser positioned before the first micro-lens array and having a diffusion angle less than or equal to the acceptance angle of each the micro-lenses in the first micro-lens array.

3. The apparatus of claim 1, wherein the first energy pulse delivered from the energy source has a first energy density per unit time and the apparatus further comprises an aperture that is adapted to block a portion of the first energy pulse to improve the uniformity of the first energy density per unit time.

4. The apparatus of claim 1, wherein the energy source is adapted to deliver a first energy pulse delivered at one or more wavelengths less than or equal to about 1064 nm and has a total energy greater than about 2 Joules and pulse width between about 20 ns and about 30 ns.

5. The apparatus of claim 1, wherein the energy source comprises:

a first energy source that is adapted to deliver a first portion of the first energy pulse that has a first pulse width;

a second energy source that is adapted to deliver a second portion of the first energy pulse that has a second pulse width; and

a controller that is adapted to synchronize the delivery of the first portion and the second portion, wherein the pulse width of the first portion and the pulse width of the second portion is less than pulse width of the first energy pulse.

6. The apparatus of claim 1, further comprising a processing chamber that comprises:

one or more walls that enclose a processing region, wherein one of the one or more walls is adapted to transmit at least a portion of the energy delivered in the first energy pulse;

a substrate support that is positioned to receive at least a portion of the energy transferred in the first energy pulse through the one of the one or more walls; and

a heat exchanging device that is adapted to heat or cool the substrate positioned on the substrate support.

7. The apparatus of claim 6, wherein the heat exchanging device is adapted to heat the substrate to a temperature between about 20°

C. and about 500°

C.

8. A method of thermally processing a substrate, comprising:

positioning a substrate on a substrate support;

delivering a first energy pulse having a first wavelength and first pulse width to a first lens from a first energy source;

transmitting at least a portion of the first energy pulse to a first micro-lens array from the first lens so that the uniformity of the image received by two or more micro-lenses is at least partially different;

transmitting at least a portion of the energy received by the first micro-lens array to a second micro-lens array, wherein the first micro-lens array is adapted to increase the energy density of the portion of the energy received by the second lens array; and

transmitting at least a portion of the energy received by the second micro-lens array to a second lens, wherein the second lens is adapted to transmit the received energy to components that transfer the energy to a region on the surface of the substrate positioned on the substrate support and to correct quadratic phase aberration.

9. The method of claim 8, further comprising heating a substrate support so that the substrate positioned thereon is at a temperature between about 20°

C. and about 600°

C. before a portion of the first pulse is delivered to the surface of the substrate.

10. The method of claim 8, wherein the region on the surface of the substrate is between about 4 mm² and about 1000 mm² in area.

11. The method of claim 8, further comprising delivering a second energy pulse having a second wavelength and a second pulse width to the first lens from a second energy source, wherein the first energy pulse and the second energy pulse are synchronized by use of a controller.

12. The method of claim 8, further comprising:

delivering the first energy pulse to a beam splitter before delivering the first energy pulse to the first lens so that a first sub-pulse and a second sub-pulse are formed;

directing the first sub pulse towards a beam combining device;

directing the second sub-pulse towards a plurality of mirrors that are adapted to deliver the second sub-pulse to the beam combining device, wherein the distance the first sub-pulse has to travel is shorter than the distance the second sub-pulse has to travel; and

delivering the first sub-pulse and the second sub-pulse from the beam combining device to the first lens.

13. The method of claim 8, further comprising positioning a random diffuser before the first micro-lens array so that it can receive at least a portion of the first energy pulse.

14. The method of claim 8, wherein the first wavelength is less than or equal to about 1064 nm and the first pulse width is between about 6 ns and about 30 ns.