Method and apparatus for extracting dose and focus from critical dimension data

• US 8,149,384 B2
• Filed: 12/17/2007
• Issued: 04/03/2012
• Est. Priority Date: 12/17/2007
• Status: Expired due to Fees

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Chauhan, Siddharth, Lensing, Kevin R., Stirton, James Broc
• Primary Examiner(s): Kim, Peter B
• Assistant Examiner(s): LIU, MICHAEL
• Application Number:
  US11/958,086
• Publication Number:
  US 20090153818A1
• Time in Patent Office: 1,569 Days
• Field of Search: 355/55, 355/77, 355/53
• US Class Current: 355/55
• CPC Class Codes: G03B 27/42 for automatic sequential copying of the same original G03B27/34, G03B27/53 take precedence
• CPC Class Codes: G03F 7/70491 Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
• CPC Class Codes: G03F 7/70616 Monitoring the printed patterns

Abstract

A method for monitoring a photolithography system includes defining a model of the photolithography system for modeling top and bottom critical dimension data associated with features formed by the photolithography system as a function of dose and focus. A library of model inversions is generated for different combinations of top and bottom critical dimension values. Each entry in the library specifies a dose value and a focus value associated with a particular combination of top and bottom critical dimension values. A top critical dimension measurement and a bottom critical dimension measurement of a feature formed by the photolithography system using a commanded dose parameter and a commanded focus parameter are received. The library is accessed using the top and bottom critical dimension measurements to generate values for a received dose parameter and the received focus parameter. The received dose and focus parameters are compared to the commanded dose and focus parameters to characterize the photolithography system.

Claims

1. A method for monitoring a photolithography system, comprising:

defining a model of the photolithography system for modeling top and bottom critical dimension data associated with features formed by the photolithography system as a function of dose and focus;

generating a library of model inversions of the model for different combinations of top and bottom critical dimension values, each entry in the library specifying a dose value and a focus value associated with a particular combination of top and bottom critical dimension values;

receiving by a computing device a top critical dimension measurement and a bottom critical dimension measurement of a feature formed by the photolithography system using a commanded dose parameter and a commanded focus parameter;

accessing the library using the top and bottom critical dimension measurements to generate values for a received dose parameter and a received focus parameter in the computing device by;

identifying a set of entries in the library having top and bottom critical dimension values closer to the top and bottom critical dimension measurements than the other entries in the library;

selecting the entry in the set having associated dose and focus values closest to the commanded dose and focus parameters; and

providing the dose and focus values associated with the selected entry as the received dose and focus parameters; and

comparing, by the computing device, the received dose and focus parameters to the commanded dose and focus parameters to characterize the photolithography system.

2. The method of claim 1, wherein accessing the library comprises selecting an entry in the library closest to the top and bottom critical dimension measurements.

3. The method of claim 1, wherein identifying the set of entries further comprises employing a Delaunay Tessellation of the library entries to identify a set of three entries closest to the top and bottom critical dimension measurements.

4. The method of claim 3, wherein the three entries define a triangle having three sides, and the method further comprises:

determining a length of each side; and

employing a numerical method to invert the model to generate the received dose and focus parameters based on the top and bottom critical dimension measurements responsive to the length of at least one of the sides exceeding a predetermined threshold.

5. The method of claim 1, wherein accessing the library further comprises:

defining a convex hull for the entries in the library; and

inverting the model to calculate the received dose and focus parameters based on the top and bottom critical dimension measurements responsive to the top and bottom critical dimension measurements lying outside the convex hull.

6. The method of claim 1, wherein generating the library comprises:

defining a plurality of different combinations of top and bottom critical dimension values; and

inverting the model for each combination to calculate a dose value and a focus value.

7. The method of claim 6, wherein inverting the model further comprises inverting the model using a numerical method.

8. The method of claim 7, wherein inverting the model using the numerical method further comprises selecting the dose value and the focus value that minimizes the sum of the squared errors of the top critical dimension value and the bottom critical dimension value.

9. The method of claim 6, further comprising removing substantially duplicate entries from the library and storing them in a supplemental library.

10. The method of claim 9, further comprising:

identifying a set of entries in the library having top and bottom critical dimension values closest to the top and bottom critical dimension measurements;

adding entries in supplemental library that are substantial duplicates of any entries in the set to the set;

selecting the entry in the set having associated dose and focus values closest to the commanded dose and focus parameters; and

providing the dose and focus values associated with the selected entry as the received dose and focus parameters.

11. The method of claim 1, further comprising controlling an operating recipe of a photolithography tool in the photolithography system based on the comparison.

12. The method of claim 1, further comprising validating operability of a photolithography tool in the system based on the comparison.

13. The method of claim 1, further comprising identifying a fault condition associated with the photolithography system based on the comparison.

14. The method of claim 1, further comprising determining a correlation metric for the model at an expected operating dose and focus point for the photolithography system.

15. The method of claim 14, wherein the model comprises a top critical dimension model and a bottom critical dimension model, and determining the correlation metric further comprises:

determining a first partial derivative of the top critical dimension model at the expected operating dose and focus point with respect to dose;

determining a second partial derivative of the top critical dimension model at the expected operating dose and focus point with respect to focus;

determining a third partial derivative of the bottom critical dimension model at the expected operating dose and focus point with respect to dose;

determining a fourth partial derivative of the bottom critical dimension model at the expected operating dose and focus point with respect to focus; and

generating the correlation metric based on the first, second, third, and fourth partial derivatives.

16. The method of claim 1, further comprising determining a sensitivity metric defining a minimum dose and focus resolution of the photolithography system at the commanded dose and focus parameters.

17. The method of claim 16, wherein determining the sensitivity metric further comprises:

generating expected top and bottom critical dimension values given the commanded dose and focus parameters using the model;

generating a critical dimension distribution based on the expected top and bottom critical dimension values and a noise estimate;

employing the library for each point in the critical dimension distribution to generate a focus distribution and a dose distribution;

determining a focus sensitivity metric based on a standard deviation of the focus distribution; and

determining a dose sensitivity metric based on a standard deviation of the dose distribution.

18. A system, comprising:

a photolithography tool operable to generate a feature on a wafer using a commanded dose parameter and a commanded focus parameter;

a metrology tool operable to measure a top critical dimension of the feature and a bottom critical dimension of the feature;

a photolithography solver operable to define a model of the photolithography tool for modeling top and bottom critical dimension data associated with features formed by the photolithography tool as a function of dose and focus, and generate a library of model inversions of the model for different combinations of top and bottom critical dimension values, each entry in the library specifying a dose value and a focus value associated with a particular combination of top and bottom critical dimension values;

a photolithography monitor operable to receive the top critical dimension measurement and the bottom critical dimension measurement, access the library using the top and bottom critical dimension measurements to generate values for a received dose parameter and a received focus parameter by identifying a set of entries in the library having top and bottom critical dimension values closer to the top and bottom critical dimension measurements than the other entries in the library, selecting the entry in the set having associated dose and focus values closest to the commanded dose and focus parameters, and providing the dose and focus values associated with the selected entry as the received dose and focus parameters, and compare the received dose and focus parameters to the commanded dose and focus parameters to characterize the photolithography tool.

19. The system of claim 18, wherein the photolithography monitor is operable to provide the top critical dimension measurement and the bottom critical dimension measurement to the photolithography solver, and the photolithography solver is operable to select an entry in the library closest to the top and bottom critical dimension measurements.

20. The system of claim 18, wherein the photolithography solver is operable to employ a Delaunay Tessellation of the library entries to identify a set of three entries closest to the top and bottom critical dimension measurements.