Support structure for MEMS device and methods therefor

• US 8,149,497 B2
• Filed: 02/24/2010
• Issued: 04/03/2012
• Est. Priority Date: 07/22/2005
• Status: Expired due to Fees

• Current Assignee: Snaptrack Incorporated (Qualcomm, Inc.)
• Original Assignee: Qualcomm MEMS Technologies Incorporated (Qualcomm, Inc.)
• Inventors: Sasagawa, Teruo, Chui, Clarence, Kothari, Manish, Ganti, SuryaPrakash, Sampsell, Jeffrey B., Wang, Chun-Ming
• Primary Examiner(s): PINKNEY, DAWAYNE
• Application Number:
  US12/711,594
• Publication Number:
  US 20100149627A1
• Time in Patent Office: 769 Days
• Field of Search: 359290-292, 359/295, 359223-225, 359/245, 359260-263, 359/298, 359/198, 359301-303, 359317-318, 359/237, 359/242
• US Class Current: 359/291
• CPC Class Codes: B81B 2201/042 Micromirrors, not used as optical switches
• CPC Class Codes: B81B 2203/0307 Anchors
• CPC Class Codes: B81C 1/00595 Control etch selectivity
• CPC Class Codes: B81C 2201/014 by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means

Abstract

A microelectromechanical systems device having support structures formed of sacrificial material surrounded by a protective material. The microelectromechanical systems device includes a substrate having an electrode formed thereon. Another electrode is separated from the first electrode by a cavity and forms a movable layer, which is supported by support structures formed of a sacrificial material.

Claims

1. A microelectromechanical systems device comprising:

a substrate having a first electrode layer formed thereon;

a second electrode layer formed over the first electrode layer and spaced apart from the first electrode layer by a cavity;

at least one support structure formed below a portion of the second electrode, the at least one support structure comprising side surfaces surrounding the support structure, wherein the at least one support structure is configured to support the second electrode layer over the cavity; and

a protective material surrounding the at least one support structure to isolate the at least one support structure from the cavity, wherein the protective material comprises a side cover that covers the side surfaces and a top cover that covers a top surface of the support structure, and wherein an outer diameter of the top cover of the protective material is greater than an outer diameter of the side cover of the protective material, and wherein a portion of the protective material is positioned between the portion of the second electrode layer and the top surface of the support structure,

wherein the protective material is selected from the group of a self-planarizing material, photoresist, and spin-on dielectric.

2. The microelectromechanical systems device of claim 1, wherein the at least one support structure is formed over the first electrode layer and the protective material is a self-planarizing material.

3. The microelectromechanical systems device of claim 1, wherein the protective material comprises photoresist.

4. The microelectromechanical systems device of claim 1, wherein the protective material comprises spin-on dielectric.

5. The microelectromechanical systems device of claim 1, wherein the second electrode layer is configured to be movable.

6. The microelectromechanical systems device of claim 1, wherein the protective material has a thickness in a range of about 500 Å

to one micron.

7. The microelectromechanical systems device of claim 1, wherein the at least one support structure comprises an inorganic material.

8. The microelectromechanical systems device of claim 1, wherein the at least one support structure comprises a material selected from the group consisting of silicon, molybdenum, tungsten, and titanium.

9. The microelectromechanical systems device of claim 1, wherein the first electrode layer has a dielectric top surface exposed to the cavity.

10. The microelectromechanical systems device of claim 1, wherein the second electrode layer comprises an aluminum surface exposed to the cavity.

11. The microelectromechanical systems device of claim 1, wherein the at least one support structure is selectively etchable with respect to the protective material.

12. The microelectromechanical systems device of claim 11, wherein the at least one support structure is etchable by xenon difluoride.

13. The microelectromechanical systems device of claim 1, wherein the protective material comprises a dielectric material.

14. The microelectromechanical systems device of claim 1, wherein the side surfaces of the support structure are vertical.

15. A method of making an interferometric modulator device, comprising:

providing a substrate having a first electrode layer formed over the substrate;

forming at least one support structure over the substrate, wherein forming the at least one support structure comprises;

depositing a sacrificial material over the first electrode layer,

etching at least one annular opening in the sacrificial material after depositing the sacrificial material, and

filling the at least one annular opening with a protective material to define the at least one support structure having side surfaces surrounded by the protective material while covering at least a portion of a top surface of the support structure with the protective material;

forming a second electrode layer over the first electrode layer and the at least one support structure after forming the at least one support structure; and

creating a cavity between the first electrode layer and the second electrode layer after forming the second electrode layer, by selectively removing the sacrificial material outside of the protective material after forming the second electrode layer.

16. The method of claim 15, wherein the sacrificial material comprises a material selected from the group consisting of silicon, molybdenum, tungsten, titanium, and photoresist.

17. The method of claim 15, wherein creating the cavity comprises etching using xenon difluoride.

18. The method of claim 15, wherein the protective material comprises a dielectric material.