Apparatus and method for pressure fluctuation insensitive mass flow control

• US 8,150,553 B2
• Filed: 08/31/2010
• Issued: 04/03/2012
• Est. Priority Date: 06/24/2002
• Status: Expired due to Term

• Current Assignee: MKS Instruments Incorporated
• Original Assignee: MKS Instruments Incorporated
• Inventors: Shajii, Ali, Kottenstette, Nicholas, Ambrosina, Jesse
• Primary Examiner(s): Chaki, Kakali
• Assistant Examiner(s): RAO, SHEELA S
• Application Number:
  US12/873,089
• Publication Number:
  US 20100324743A1
• Time in Patent Office: 581 Days
• Field of Search: 700/1, 700/275, 700/281, 700/282, 137/12, 137/14, 137/486, 137/487, 137/487.5, 702/12, 702/45, 702/50, 702/100, 702/144, 73/13.5
• US Class Current: 700/282
• CPC Class Codes: G05D 7/0635 by action on throttling means G05D7/0688, G05D7/0694 take precedence
• CPC Class Codes: Y10T 137/0396 Involving pressure control
• CPC Class Codes: Y10T 137/7759 Responsive to change in rate of fluid flow
• CPC Class Codes: Y10T 137/776 Control by pressures across flow line valve

Abstract

A mass flow controller includes a thermal mass flow sensor in combination with a pressure sensor to provide a mass flow controller that is relatively insensitive to fluctuations in input pressure. The pressure sensor and thermal sensor respectively provide signals to an electronic controller indicating the measured inlet flow rate and the pressure within the dead volume. The electronic controller employs the measured pressure to compensate the measured inlet flow rate and to thereby produce a compensated measure of the outlet flow rate, which may be used to operate a mass flow controller control valve.

Claims

1. A process control system comprising:

a process controller including a processor, a sensor interface, and an actuator interface, and configured to generate a control signal as a function of a sensed mass flow and measured fluctuations in pressure of a gas flow controlled by a mass flow controller, wherein the process controller is configured so as to provide a control signal to the mass flow controller that controls the mass flow controller to produce a constant flow of gas at an outlet of the mass flow controller irrespective of fluctuations in pressure of gas at the inlet.

2. The process control system of claim 1, wherein the mass flow controller includes a pressure sensor that is configured to measure fluctuations in pressure of gas along a flow path of the mass flow controller and produce corresponding pressure signals, and wherein the process controller is configured to receive the pressure signals.

3. The process control system of claim 1, wherein the mass flow controller includes a thermal sensor configured to measure temperature associated with the gas flow and to produce a corresponding temperature signal, and wherein the process controller is configured to receive the temperature signal.

4. The process control system of claim 1, wherein the process controller is configured to receive pressure signals from a pressure sensor that is configured to measure fluctuations in pressure of gas along a flow path of the mass flow controller and that is configured to produce corresponding pressure signals.

5. The process control system of claim 1, wherein the process controller is configured to receive temperature signals from a thermal sensor that is configured to measure temperature of gas along a flow path of the mass flow controller and that is configured to produce a corresponding temperature signal.

6. The process control system of claim 1, wherein the process controller further comprises a pressure sensor interface.

7. The process control system of claim 1, wherein the process controller further comprises a temperature sensor interface.

8. The process control system of claim 1, wherein the process controller further comprises a user interface.

9. The process control system of claim 1, wherein the process controller further comprises a storage location.