Semiconductor device
First Claim
Patent Images
1. A semiconductor device comprising:
- a plurality of first insulating films and gate electrodes alternately laminated above a semiconductor substrate;
a body section penetrating through the plurality of first insulating films and gate electrodes, and containing an insulating region; and
a second insulating film surrounding the body section, having a charge accumulating ability formed between the body section and the gate electrode.
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Abstract
A semiconductor device has a substrate, a source region formed on the surface portion of the substrate, a first insulating layer formed on the substrate, a gate electrode formed on the first insulating layer, a second insulating layer formed on the gate electrode, a body section connected with the source region, penetrating through the first insulating layer, the gate electrode and the second insulating layer, and containing a void, a gate insulating film surrounding the body section, and formed between the body section and the gate electrode, and a drain region connected with the body section.
8 Citations
6 Claims
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1. A semiconductor device comprising:
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a plurality of first insulating films and gate electrodes alternately laminated above a semiconductor substrate; a body section penetrating through the plurality of first insulating films and gate electrodes, and containing an insulating region; and a second insulating film surrounding the body section, having a charge accumulating ability formed between the body section and the gate electrode. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification