Lithographic apparatus and device manufacturing method

• US 8,154,708 B2
• Filed: 07/07/2006
• Issued: 04/10/2012
• Est. Priority Date: 06/09/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Kolesnychenko, Aleksey Yurievich, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Streefkerk, Bob, Bijlaart, Erik Theodorus Maria, Hoogendam, Christiaan Alexander, Van Santen, Helmar, Van De Kerhof, Marcus Adrianus, Kroon, Mark, Den Boef, Arie Jeffrey, Ottens, Joost Jeroen, Mertens, Jeroen Johannes Sophia Maria
• Primary Examiner(s): Kim, Peter B
• Assistant Examiner(s): Liu, Chia-how Michael
• Application Number:
  US11/482,122
• Publication Number:
  US 20070132979A1
• Time in Patent Office: 2,104 Days
• Field of Search: 355/30, 355/53, 355/72, 355/77, 355 73- 76, 356/400, 356/401
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Claims

1. An exposure apparatus comprising:

a projection optical system configured to project a pattern on a reticle onto an object to be exposed;

a sensor or a mark that serves as a reference for an alignment between the reticle and the object;

a liquid supply system configured to supply fluid that has a refractive index of 1 or greater to a space between at least part of said projection optical system and the object and a space between at least part of said projection optical system and the sensor or mark;

a stage configured to support the object, wherein the sensor or mark is on the stage;

a plate configured to be mounted on the stage and made of a transparent material that transmits radiation, the plate configured to be located between the sensor or mark and the projection optical system or a light source; and

a structure configured to extend at least up to the plate and to be in contact with the plate, the structure disposed between a recess configured to receive the object therein and the sensor or mark.

2. An exposure apparatus according to claim 1, comprising the sensor and the sensor comprises a radiation detector, the radiation detector configured to receive radiation that transmits through the plate,

wherein said exposure apparatus is configured to provide a fluid that has a refractive index of 1 or greater to a space between the plate and the radiation detector.

3. An exposure apparatus according to claim 1, comprising the mark and wherein said exposure apparatus is configured to provide a fluid to a space between the mark and the plate, the fluid having a refractive index of 1 or greater.

4. A device manufacturing method comprising the steps of:

exposing an object using an exposure apparatus according to claim 1; and

developing the object that has been exposed.

5. An exposure apparatus according to claim 1, wherein a top surface of the sensor or mark is substantially co-planar with a top surface of the object when supported on the stage.

6. An exposure apparatus according to claim 1, wherein the liquid supply system or a further liquid supply system is configured to provide a fluid that has a refractive index of water or greater to a space between the plate and the sensor or mark using a fluid supply port on the stage.

7. An exposure apparatus according to claim 1, wherein the liquid supply system or a further liquid supply system is configured to provide a fluid that has a refractive index of water or greater to the recess using a fluid supply port on the stage.

8. An exposure apparatus comprising:

a projection optical system configured to project a pattern on a reticle onto an object;

a sensor or a mark that serves as a reference for an alignment between the reticle and the object;

a stage configured to support the object, wherein the sensor or mark is on the stage;

a plate configured to be mounted on the stage and made of a transparent material that transmits radiation, the plate configured to be located between the sensor or mark and the projection optical system or a light source;

a liquid supply system configured to supply a fluid that has a refractive index of 1 or greater to a space between said sensor or mark and said plate; and

a structure configured to extend at least up to the plate and to be in contact with the plate, the structure disposed between a recess configured to receive the object therein and the sensor or mark.

9. An exposure apparatus according to claim 8, wherein a top surface of the sensor or mark is substantially co-planar with a top surface of the object when supported on the stage.

10. An exposure apparatus according to claim 8, wherein the liquid supply system or a further liquid supply system is configured to provide a fluid that has a refractive index of water or greater to the recess using a fluid supply port on the stage.

11. A device manufacturing method comprising the steps of:

exposing an object using an exposure apparatus according to claim 8; and

developing the object that has been exposed.

12. A method comprising:

projecting a pattern on a reticle onto an object on a stage using a projection optical system;

supporting a sensor or a mark that serves as a reference for an alignment between the reticle and the object on the stage, wherein a plate made of a transparent material that transmits radiation is mounted on the stage and located between the sensor or mark and the projection optical system or a light source and wherein a structure extends at least up to the plate and is in contact with the plate, the structure disposed between a recess having the object therein and the sensor or mark; and

supplying fluid that has a refractive index of water or greater to a space between at least part of said projection optical system and the object and a space between at least part of said projection optical system and the sensor or mark.

13. A method according to claim 12, comprising supporting the sensor, the sensor comprising a radiation detector configured to receive radiation that transmits through the plate, and comprising providing a fluid that has a refractive index of water or greater to a space between the plate and the radiation detector.

14. A method according to claim 12, comprising supporting the mark and comprising providing a fluid to a space between the mark and the plate, the fluid having a refractive index of water or greater.

15. A method according to claim 12, wherein a top surface of the sensor or mark is substantially co-planar with a top surface of the object when supported on the stage.

16. A method according to claim 12, comprising providing a fluid that has a refractive index of water or greater to a space between the plate and the sensor or mark using a fluid supply port on the stage.

17. A method according to claim 12, comprising providing a fluid that has a refractive index of water or greater to the recess using a fluid supply port on the stage.

18. A method comprising:

projecting a pattern on a reticle onto an object on a stage using a projection optical system;

supporting a sensor or a mark that serves as a reference for an alignment between the reticle and the object on the stage, wherein a plate made of a transparent material that transmits radiation is mounted on the stage and located between the sensor or mark and the projection optical system or a light source and wherein a structure extends at least up to the plate and is in contact with the plate, the structure disposed between a recess having the object therein and the sensor or mark; and

supplying a fluid that has a refractive index of water or greater to a space between the sensor or mark and the plate.

19. A method according to claim 18, wherein a top surface of the sensor or mark is substantially co-planar with a top surface of the object when supported on the stage.

20. A method according to claim 18, comprising providing a fluid that has a refractive index of water or greater to the recess using a fluid supply port on the stage.