Piezo-resistive detection resonant device made using surface technologies

• US 8,156,807 B2
• Filed: 06/20/2008
• Issued: 04/17/2012
• Est. Priority Date: 06/25/2007
• Status: Active Grant

• Current Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Original Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Inventors: Robert, Philippe
• Primary Examiner(s): CHAPMAN JR, JOHN E
• Application Number:
  US12/214,627
• Publication Number:
  US 20080314148A1
• Time in Patent Office: 1,397 Days
• Field of Search: 735/79, 735/142.9, 735/143.3, 737/04, 738/625.9, 735/041.2, 735/041.6
• US Class Current: 73/514.29
• CPC Class Codes: B81B 2201/0235 Accelerometers
• CPC Class Codes: B81B 2201/0242 Gyroscopes
• CPC Class Codes: B81B 2201/0264 Pressure sensors
• CPC Class Codes: B81B 2201/0271 Resonators; ultrasonic resonators
• CPC Class Codes: B81B 3/0086 Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
• CPC Class Codes: G01C 19/574 the devices having two sensing masses in anti-phase motion
• CPC Class Codes: G01C 19/5755 the devices having a single sensing mass
• CPC Class Codes: G01C 19/5769 Manufacturing; Mounting; Housings
• CPC Class Codes: G01L 1/183 by measuring variations of frequency of vibrating piezo-resistive material
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 15/097 by vibratory elements
• CPC Class Codes: H03H 9/02259 Driving or detection means

Abstract

This invention relates to a resonant device with detection in the piezo-resistive plane made using surface technologies on a bulk, which comprises a resonator connected to this bulk by at least one embedded portion, means of exciting this resonator and detection means comprising at least one suspended beam type strain gauge made from piezo-resistive material, in which each strain gauge has a common plane with the resonator, and is connected to this resonator at a point situated outside of this at least one embedded portion to increase the stress observed by this strain gauge.

Claims

1. Resonant device with detection in a plane where piezo-resistive detection occurs, the resonant device made using surface micromachining substrate technologies on a bulk, characterised in that it comprises:

a resonator connected to this bulk substrate by at least one embedded portion,

means of exciting this resonator and

detection means comprising at least one suspended beam type strain gauge made from piezo-resistive material, wherein each strain gauge has at least one common plane with the resonator, and is connected, in a first end to this resonator at a point situated outside of this at least one embedded portion to increase the stress observed by this strain gauge, and in a second end to the substrate.

2. Device according to claim 1, characterised in that the resonator has a length L in said plane, wherein said point is located at a distance less than or equal to ¼

of L.

3. Device according to claim 1, characterised in that each piezo-resistive gauge is a silicon nanowire.

4. Device according to claim 1, characterised in that each piezo-resistive gauge comprises two parallel arms.

5. Device according to claim 1, characterised in that the excitation means are electrostatic, thermal or piezo-electric means.

6. Device according to claim 1, characterised in that the detection means comprise means of measuring the stress of the gauge by measuring the resistance between the end of the beam type gauge and the embedded portion of the resonator at the support or between two parallel arms of the gauge.

7. Device according to claim 1, characterised in that each piezo-resistive strain gauge is positioned perpendicularly to the resonator.

8. Device according to claim 1, characterised in that the resonator and each piezo-resistive strain gauge are made from a same piezo-resistive material.

9. Device according to claim 8, characterised in that this material is silicon or SiGe and in that the resonator and each piezo-resistive strain gauge are connected mechanically and electrically.

10. Device according to claim 9, characterised in that each piezo-resistive strain gauge is defined by etching a beam in the silicon, wherein this gauge operates in tension/compression.

11. Device according to claim 9, characterised in that each resonator, equipped with at least one embedded portion in a bulk, includes excitation means and detection means comprising at least one strain gauge comprising a suspended beam made from piezo-resistive material connected to the resonator, and characterised in that each piezo-resistive strain gauge has at least one common plane with the resonator, and is positioned close to a embedded portion of the resonator to increase the lever-arm effect.

12. Device according to claim 1, which comprises a resonant sensor that has at least one resonator associated to an element capable of creating a variation of its characteristics depending on the quantity to be measured, and in which a variation of the frequency of the resonator or a variation of the resistance, detected by at least one associated strain gauge, results from this variation of characteristics.

13. Device according to claim 12, characterised in that each resonator vibrates in the plane.

14. Device according to claim 12, characterised in that the excitation means of each resonator comprise at least one electrode to excite it.

15. Device according to claim 12, characterised in that each piezo-resistive strain gauge operates in compression/tension.

16. Device according to claim 12, characterised in that each piezo-resistive strain gauge is defined by silicon etching.

17. Device according to claim 12, characterised in that a seismic mass, associated to the resonator, is capable, under the action of an acceleration, of exerting a stress on this resonator.

18. Accelerometer comprising at least one device according to claim 17.

19. Gyrometer comprising at least one device according to claim 17.

20. Device according to claim 12, characterised in that each resonator is coated with a material capable of capturing certain molecules.

21. The resonant device of claim 1, wherein the width of the beam type strain gauge is smaller than the width of the resonator.