Resonator and methods of making resonators
First Claim
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1. A method, comprising:
- etching a silicon substrate to form a resonator structure, wherein the resonator structure includes at least one resonator beam;
at least partially converting the at least one resonator beam to dry oxide; and
etching through at least a portion of a mounting substrate coupled to the silicon substrate to provide electrical connections.
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Abstract
A resonator and method of making a resonator are provided. A particular method includes etching a silicon substrate to form a resonator structure. The resonator structure includes at least one resonator beam. The method also includes converting at least a portion of the at least one resonator beam to dry oxide.
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Citations
18 Claims
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1. A method, comprising:
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etching a silicon substrate to form a resonator structure, wherein the resonator structure includes at least one resonator beam; at least partially converting the at least one resonator beam to dry oxide; and etching through at least a portion of a mounting substrate coupled to the silicon substrate to provide electrical connections. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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coupling a silicon substrate to a mounting substrate; etching the silicon substrate to form a resonator structure, wherein the resonator structure includes at least one resonator beam; at least partially converting the at least one resonator beam to dry oxide; and etching a via through the mounting substrate to provide an electrical connection. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method comprising:
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etching a silicon substrate to form a resonator structure, wherein the resonator structure includes circumferential segments; and increasing a quality factor of the resonator structure by oxidizing the resonator structure until the circumferential segments are substantially oxidized; wherein the circumferential segments are supported by a plurality of radial segments. - View Dependent Claims (16)
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17. A method comprising:
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etching a silicon substrate to form a resonator structure, wherein the resonator structure includes circumferential segments; and increasing a quality factor of the resonator structure by oxidizing the resonator structure until the circumferential segments are substantially oxidized; wherein the circumferential segments are concentric, and wherein the resonator structure includes a disc that includes a plurality of slots formed from the circumferential segments.
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18. A method comprising:
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etching a silicon substrate to faun a resonator structure, wherein the resonator structure includes circumferential segments; increasing a quality factor of the resonator structure by oxidizing the resonator structure until the circumferential segments are substantially oxidized; and etching through at least a portion of a mounting substrate coupled to the silicon substrate.
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Specification