Lithographic apparatus and device manufacturing method
First Claim
1. A device manufacturing method using a maskless lithography system, the method comprising:
- illuminating a patterning array assembly having a plurality of patterning arrays, each patterning array having a substrate and a plurality of individually controllable elements coupled to the substrate wherein the patterning array assembly is in a first orientation in a first plane;
adjusting a position of the substrate of at least one patterning array in the patterning array assembly from the first orientation in the first plane to a second orientation with respect to the first plane; and
exposing an object with the patterned light from the patterning array assembly.
1 Assignment
0 Petitions
Accused Products
Abstract
A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a patterned cross-section. To reduce the global unflatness of the patterning array assembly that is oriented in a first plane, the position of at least one substrate of a patterning array is adjusted to a second orientation. Reduction of the global unflatness of the patterning array assembly reduces a telecentricity error without introducing additional error into the maskless lithography system.
41 Citations
26 Claims
-
1. A device manufacturing method using a maskless lithography system, the method comprising:
-
illuminating a patterning array assembly having a plurality of patterning arrays, each patterning array having a substrate and a plurality of individually controllable elements coupled to the substrate wherein the patterning array assembly is in a first orientation in a first plane; adjusting a position of the substrate of at least one patterning array in the patterning array assembly from the first orientation in the first plane to a second orientation with respect to the first plane; and exposing an object with the patterned light from the patterning array assembly. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
-
-
12. A device manufacturing method using a maskless lithography system, comprising:
-
illuminating a patterning array assembly including patterning arrays, each patterning array having a substrate and a plurality of individually controllable elements coupled to the substrate, wherein the substrate of each of the patterning arrays has a first position; adjusting the substrate of a first one of the patterning arrays from the first position to a second position; transmitting light from the patterning array assembly through an optical system; and exposing an object with the transmitted light, wherein the first position is coplanar with the substrates of the patterning arrays in the patterning array assembly and the second position is not coplanar with the patterning array assembly. - View Dependent Claims (13, 14, 15)
-
-
16. A device manufacturing method using a maskless lithography system having a plurality of patterning arrays in a patterning array assembly, each patterning array having a substrate and a plurality of individually controllable elements coupled to the substrate, the patterning array assembly having a reflective surface, the method comprising:
-
adjusting a position of the substrate of at least one of the plurality of patterning arrays based on a detected optical aberration; illuminating the patterning array assembly; transmitting light reflected by the patterning array assembly through an optical system; and exposing an object with the light, wherein the adjusting step causes the reflective surface of the patterning array assembly to deviate from a flat plane. - View Dependent Claims (17)
-
-
18. A maskless lithography system, comprising:
-
an illumination source configured to produce light; and a patterning array assembly having patterning arrays, each patterning array in the patterning arrays having a substrate and a plurality of individually controllable elements coupled to the substrate, the substrate of each patterning array being coupled to a respective adjuster; an optics system configured to condition the light, wherein each of the respective adjusters moves the substrate of a respective one of the patterning arrays to correct for an optical aberration in the light received by an object, such that a surface of the patterning array assembly deviates from a flat plane. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
-
Specification