Non-diffusion junction split-gate nonvolatile memory cells and arrays, methods of programming, erasing, and reading thereof, and methods of manufacture
First Claim
1. An array of flash memory structures, said array comprising:
- a semiconductor substrate of a first conductivity type; and
a plurality of structures, each structure comprising;
a non-diffused channel region within the semiconductor substrate through which electron flow may be induced, in a first direction, by application of voltage to gate elements disposed above the channel region;
a plurality of floating gates, spaced apart from one another, each insulated from the channel region;
a plurality of T-shaped control gates, spaced apart from one another, each insulated from the channel region, each control gate being laterally adjacent a first floating gate in position across, the channel region, being between the first floating gate and a second floating gate, and being capacitively coupled to the first floating gate and the second floating gate, wherein each control gate and pair floating gates to which the control gate is capacitively coupled form a subcell; and
a plurality of assist gates, spaced apart from one another, each insulated from the channel region, each assist gate being between and insulated from a first subcell and a second subcell;
wherein the channel region includes a first channel region beneath the first subcell, a second channel region beneath the second subcell, and a third channel region beneath the assist gate, and wherein each subcell and each assist gate control conductivity of a channel region located therebeneath;
wherein structures adjacent to one another in a second direction, substantially perpendicular to the first direction, have the assist gate connected to one another in the first direction, and the control gate connected to one another in the second direction;
wherein operation of the second subcell as a programmed cell is enabled via electron flow induced in the first channel region, the second channel region, and the third channel region by voltages on the first floating gate associated with the first control gate, the assist gate, and the second control gate, respectively.
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Accused Products
Abstract
Nonvolatile flash memory systems and methods are disclosed having a semiconductor substrate of a first conductivity type, including non-diffused channel regions through which electron flow is induced by application of voltage to associated gate elements. A plurality of floating gates are spaced apart from one another and each insulated from the channel region. A plurality of control gates are spaced apart from one another and insulated from the channel region, with each control gate being located between a first floating gate and a second floating gate and capacitively coupled thereto to form a subcell. A plurality of spaced-apart assist gates are insulated from the channel region, with each assist gate being located between and insulated from adjacent subcells. The channel is formed of three regions, two beneath adjacent control gate elements as well as a third region between the first two and beneath an associated assist gate.
7 Citations
30 Claims
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1. An array of flash memory structures, said array comprising:
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a semiconductor substrate of a first conductivity type; and a plurality of structures, each structure comprising; a non-diffused channel region within the semiconductor substrate through which electron flow may be induced, in a first direction, by application of voltage to gate elements disposed above the channel region; a plurality of floating gates, spaced apart from one another, each insulated from the channel region; a plurality of T-shaped control gates, spaced apart from one another, each insulated from the channel region, each control gate being laterally adjacent a first floating gate in position across, the channel region, being between the first floating gate and a second floating gate, and being capacitively coupled to the first floating gate and the second floating gate, wherein each control gate and pair floating gates to which the control gate is capacitively coupled form a subcell; and a plurality of assist gates, spaced apart from one another, each insulated from the channel region, each assist gate being between and insulated from a first subcell and a second subcell; wherein the channel region includes a first channel region beneath the first subcell, a second channel region beneath the second subcell, and a third channel region beneath the assist gate, and wherein each subcell and each assist gate control conductivity of a channel region located therebeneath; wherein structures adjacent to one another in a second direction, substantially perpendicular to the first direction, have the assist gate connected to one another in the first direction, and the control gate connected to one another in the second direction; wherein operation of the second subcell as a programmed cell is enabled via electron flow induced in the first channel region, the second channel region, and the third channel region by voltages on the first floating gate associated with the first control gate, the assist gate, and the second control gate, respectively. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An array of flash memory structures, said array comprising:
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a semiconductor substrate of a first conductivity type; and a plurality of structures, each structure comprising; a non-diffused channel region within the semiconductor substrate through which electron flow may be induced, in a first direction, by application of voltage to gate elements disposed above the channel region; a plurality of floating gates, spaced apart from one another, each insulated from the channel region; a plurality of T-shaped control gates, spaced apart from one another, each insulated from the channel region, each control gate being laterally adjacent a first floating gate in position across, the channel region, being between the first floating gate and a second floating gate, and being capacitively coupled to the first floating gate and the second floating gate, wherein each control gate and pair floating gates to which the control gate is capacitively coupled form a subcell; and a plurality of assist gates, spaced apart from one another, each insulated from the channel region, each assist gate being between and insulated from a first subcell and a second subcell; wherein the channel region includes a first channel region beneath the first subcell, a second channel region beneath the second subcell, and a third channel region beneath the assist gate, and wherein each subcell and each assist gate control conductivity of a channel region located therebeneath; wherein structures adjacent to one another in a second direction, substantially perpendicular to the first direction, have the assist gate connected to one another in the first direction, and the control gate connected to one another in the second direction; wherein a read operation of the second subcell is enabled via electron flow induced in the first channel region, the second channel region, and the third channel region by voltages on the first floating gate associated with the first control gate, the assist gate, and the second control gate, respectively. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification