Display apparatus using oxide semiconductor and production method thereof
First Claim
Patent Images
1. A display apparatus, comprising:
- a transistor with an active layer;
a scanning electrode line operationally connected to the transistor;
a signal electrode line operationally connected to the transistor; and
a first insulating layer in contact with at least one of the scanning electrode line and the signal electrode line,wherein the active layer comprises an oxide which contains In and Zn and at least a part of which is amorphous,wherein a second insulating layer containing hydrogen in an amount of less than 3×
1021 atoms/cm3 is disposed between the active layer and the first insulating layer,wherein the first insulating layer contains hydrogen, andwherein the hydrogen content in the second insulating layer is less than the hydrogen content in the first insulating layer.
1 Assignment
0 Petitions
Accused Products
Abstract
A display apparatus includes a light-emitting layer, a pair of electrodes sandwiching the light-emitting layer, a transistor with an active layer for driving the light-emitting layer through the pair of the electrodes, and a matrix wiring portion having a scanning electrode line, a signal electrode line, and a first insulating layer. The active layer has an oxide which contains In and Zn and at least a part of which is amorphous, and further includes a second insulating layer containing hydrogen in an amount of less than 3×1021 atoms/cm3 disposed between the active layer and the first insulating layer.
107 Citations
21 Claims
-
1. A display apparatus, comprising:
-
a transistor with an active layer; a scanning electrode line operationally connected to the transistor; a signal electrode line operationally connected to the transistor; and a first insulating layer in contact with at least one of the scanning electrode line and the signal electrode line, wherein the active layer comprises an oxide which contains In and Zn and at least a part of which is amorphous, wherein a second insulating layer containing hydrogen in an amount of less than 3×
1021 atoms/cm3 is disposed between the active layer and the first insulating layer,wherein the first insulating layer contains hydrogen, and wherein the hydrogen content in the second insulating layer is less than the hydrogen content in the first insulating layer. - View Dependent Claims (2, 3, 4, 10, 11, 12)
-
-
5. A method of producing a display apparatus, comprising the steps of:
-
forming a scanning electrode line; forming a first insulating layer; forming a signal electrode line; forming a transistor with an active layer comprising an oxide which contains In and Zn and at least a part of which is amorphous; and forming a second insulating layer containing hydrogen in an amount of less than 3×
1021 atoms/cm3,wherein the scanning electrode line and the signal electrode line are operationally connected to the transistor, wherein the first insulating layer is in contact with at least one of the scanning electrode line and the signal electrode line, wherein the second insulating layer is disposed between the first insulating layer and the active layer, wherein the first insulating layer contains hydrogen, and wherein the hydrogen content of the second insulating layer is less than the hydrogen content of the first insulating layer. - View Dependent Claims (6, 8, 9, 13, 14, 15, 16)
-
-
7. A method of producing a display apparatus, comprising the steps of:
-
forming a matrix wiring portion having a scanning electrode line, a first insulating layer, and a signal electrode line; forming a transistor with an active layer comprising an oxide which contains In and Zn and at least a part of which is amorphous; forming a second insulating layer containing hydrogen in an amount of less than 3×
1021 atoms/cm3 between the first insulating layer and the active layer; andforming a light-emitting layer and a pair of electrodes sandwiching the light-emitting layer, wherein the formation of the transistor is performed after the formation of the matrix wiring portion and either one of the pair of electrodes.
-
-
17. A transistor comprising:
-
an active layer; a gate electrode; and a gate insulating layer between the gate electrode and the active layer, wherein the active layer comprises an oxide which contains In and Zn and at least a part of which is amorphous, and wherein the gate insulating layer contains hydrogen in an amount of less than 3×
1021 atoms/cm3, andwherein the gate insulating layer is disposed between the active layer and a first insulating layer having a higher hydrogen content than the hydrogen content of the gate insulating layer. - View Dependent Claims (18, 19, 20, 21)
-
Specification