MEMS cavity-coating layers and methods
First Claim
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1. An optical interferometric modulator comprising:
- an optical stack comprising a partial reflector and a primary dielectric layer,a reflective layer movable relative to the optical stack;
a cavity defined by the optical stack and the reflective layer; and
a supplemental conformal dielectric layer as part of an optical dielectric layer within the cavity, wherein the supplemental dielectric layer has a thickness of at least about 10 Å
over each of the primary dielectric layer and the reflective layer within the cavity, the optical dielectric layer including the primary dielectric layer and the supplemental dielectric layer over both the optical stack and the reflective layer, wherein the thickness of the supplemental dielectric layer affects the optical properties of the interferometric modulator, and wherein a total thickness of the optical dielectric layer depends upon the thicknesses of the supplemental dielectric layer and the primary dielectric layer.
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Abstract
Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the layer comprises a dielectric material. In some embodiments, the MEMS device also exhibits improved characteristics, such as improved electrical insulation between moving electrodes, reduced stiction, and/or improved mechanical properties.
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Citations
18 Claims
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1. An optical interferometric modulator comprising:
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an optical stack comprising a partial reflector and a primary dielectric layer, a reflective layer movable relative to the optical stack; a cavity defined by the optical stack and the reflective layer; and a supplemental conformal dielectric layer as part of an optical dielectric layer within the cavity, wherein the supplemental dielectric layer has a thickness of at least about 10 Å
over each of the primary dielectric layer and the reflective layer within the cavity, the optical dielectric layer including the primary dielectric layer and the supplemental dielectric layer over both the optical stack and the reflective layer, wherein the thickness of the supplemental dielectric layer affects the optical properties of the interferometric modulator, and wherein a total thickness of the optical dielectric layer depends upon the thicknesses of the supplemental dielectric layer and the primary dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. An optical interferometric modulator comprising:
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a means for partially reflecting light; a movable means for actuating the optical interferometric modulator and for reflecting light; and a supplemental dielectric means for covering both the means for partially reflecting light and a facing surface of the movable means, wherein the supplemental dielectric means and the means for partially reflecting light cooperate to define an optical dielectric means for establishing an optical path length and reflected wavelength maximized by optical interference, wherein a thickness of the supplemental dielectric means affects the optical properties of the interferometric modulator.
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16. An electromechanical systems device comprising:
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a substrate comprising a first face; a deformable layer comprising a first face and a second face; a variably-sized cavity comprising opposite internal surfaces defined by the first face of the substrate and the first face of the deformable layer; a plurality of openings in the deformable layer; and a dielectric layer in the cavity formed over the first face of the substrate and the first face of the deformable layer, wherein the dielectric layer is thicker over a plurality of locations on the first face of the substrate opposite from the openings in the deformable layer than over another location on the first face of the substrate. - View Dependent Claims (17, 18)
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Specification