Exposure apparatus and device fabrication method
First Claim
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1. A lithographic apparatus, comprising:
- a projection system arranged to project a patterned beam of radiation onto a target portion of a substrate;
a liquid supply system member that locally contains a liquid in a space between the projection system and the substrate and that forms an immersion area under the projection system;
a substrate table on which the substrate is held, the substrate table including an upper surface configured to surround the substrate held by the substrate table and the upper surface being substantially flush with a surface of the substrate held by the substrate table; and
a liquid supply system member compensator that applies a force to the liquid supply system member to at least partially compensate for an interaction between the liquid supply system member and the substrate table and that is coupled to a frame that is substantially vibrationally isolated from the projection system.
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Abstract
An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member (70) having a supply outlet (12) that supplies a liquid (LQ) and a collection inlet (22) that collects a liquid (LQ), and a vibration isolating mechanism (60) that supports the nozzle member (70) and vibrationally isolates the nozzle member (70) from a lower side step part (7) of a main column (1).
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Citations
18 Claims
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1. A lithographic apparatus, comprising:
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a projection system arranged to project a patterned beam of radiation onto a target portion of a substrate; a liquid supply system member that locally contains a liquid in a space between the projection system and the substrate and that forms an immersion area under the projection system; a substrate table on which the substrate is held, the substrate table including an upper surface configured to surround the substrate held by the substrate table and the upper surface being substantially flush with a surface of the substrate held by the substrate table; and a liquid supply system member compensator that applies a force to the liquid supply system member to at least partially compensate for an interaction between the liquid supply system member and the substrate table and that is coupled to a frame that is substantially vibrationally isolated from the projection system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A lithographic apparatus, comprising:
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a projection system arranged to project a patterned beam of radiation onto a target portion of a substrate; a liquid supply system member that contains a liquid in a space between the projection system and the substrate and that forms an immersion area of the liquid under the projection system; a substrate table on which the substrate is held, the substrate table including an upper surface configured to surround the substrate held by the substrate table and the upper surface being substantially flush with a surface of the substrate held by the substrate table; and a liquid supply system member compensator that compensates for a force exerted by one of the liquid supply system member and the substrate table toward the other, wherein the liquid supply system member compensator applies the force to the liquid supply system member to at least partially compensate for the force exerted by one of the liquid supply system member and the substrate table toward the other and is coupled to a frame that is substantially vibrationally isolated from the projection system. - View Dependent Claims (10, 11)
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12. A device manufacturing method, comprising:
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locally containing a liquid in a space between a projection system of a lithographic apparatus and a substrate table using a liquid supply system member so as to form an immersion area of the liquid under the projection system; compensating for an interaction between the liquid supply system member and the substrate table by using a liquid supply system member compensator coupled to a frame that is substantially vibrationally isolated from the projection system; and projecting a patterned radiation beam through the liquid onto a target portion of the substrate held by the substrate table using the projection system, the substrate table including an upper surface configured to surround the substrate held by the substrate table such that an edge area is exposed through the liquid of the immersion area formed under the projection system. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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Specification