Exposure apparatus and method for producing device
First Claim
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1. An exposure apparatus comprising:
- an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate;
a member having a surface and is movable to a position at which the surface of the member faces the optical element, the member being different from the substrate; and
a cleaning system which cleans the surface of the member.
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Abstract
An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.
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Citations
83 Claims
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1. An exposure apparatus comprising:
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an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate; a member having a surface and is movable to a position at which the surface of the member faces the optical element, the member being different from the substrate; and a cleaning system which cleans the surface of the member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56)
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57. A method for making an exposure apparatus comprising:
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providing an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate; providing a member having a surface, the member being movable to a position at which the surface of the member faces the optical element, the member being different from the substrate; and providing a cleaning system which cleans the surface of the member.
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58. A cleaning method comprising:
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moving a member of an exposure apparatus which expose a substrate by projecting a patterned beam onto the substrate through exposure liquid filled in a space between an optical element of the exposure apparatus and the substrate, the member being different from the substrate and being movable to a position at which a surface of the member faces the optical element; and cleaning the surface of the member in the exposure apparatus. - View Dependent Claims (59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83)
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69. The cleaning method according to clam 68, wherein the exposure liquid covers only a portion of a surface of the substrate during the projection in the exposure apparatus.
Specification