Lithographic apparatus and device manufacturing method

• US 8,169,593 B2
• Filed: 10/30/2008
• Issued: 05/01/2012
• Est. Priority Date: 12/27/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bijnen, Franciscus Godefridus Casper, De Smit, Joannes Theodoor
• Primary Examiner(s): Kim, Peter B
• Assistant Examiner(s): Riddle, Christina
• Application Number:
  US12/261,663
• Publication Number:
  US 20090051891A1
• Time in Patent Office: 1,279 Days
• Field of Search: 355/52, 355/53, 355/55, 355 67- 71, 355 72- 74, 430/8, 430/22, 430/30, 430/311, 250/492.1, 250/492.2, 250/492.22, 250/493.1, 250/548, 356/139, 356399-401
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels
• CPC Class Codes: G03F 9/7003 Alignment type or strategy, e.g. leveling, global alignment

Abstract

A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.

Claims

1. A lithographic apparatus, comprising:

an array of individually controllable elements configured to provide a patterned beam of radiation;

a projection system configured to project the patterned beam onto a target portion of a substrate;

a movement system configured to cause relative movement between the substrate and the projection system; and

a detection system configured to determine a position of the substrate relative to the projection system based on a distance between first and second adjacent indiscrete alignment marks located on a surface of the substrate.

2. The apparatus of claim 1, wherein the detection system is configured to detect rows of alignment marks on the substrate.

3. The apparatus of claim 1, wherein the detection system is configured to detect rows of alignment marks spaced apart along edge portions of the substrate.

4. The apparatus of claim 1, wherein the detection system is configured to detect rows of alignment marks at a plurality of positions across the substrate.

5. The apparatus of claim 1, wherein the detection system comprises at least one camera.

6. The apparatus of claim 1, wherein the detection system comprises:

an array of lenses; and

at least one detector configured to detect radiation reflected from the substrate through the array of lenses.

7. The apparatus of claim 1, wherein:

the projection system comprises a lens array configured to focus the patterned beam onto the target surface of the substrate; and

the detection system comprises at least one detector configured to detect radiation reflected from the substrate through the array of lenses.

8. The apparatus of claim 1, further comprising:

a controller configured to control the array of individually controllable elements,

wherein the detection system is configured to provide a signal to the controller, the signal being indicative of a position of the substrate relative to the projection system, the controller being configured to control the elements according to the signal from the detection system.

9. The apparatus of claim 1, further comprising:

a controller configured arranged to control the movement system,

wherein the detection system is configured to provide a signal to the controller, the signal being indicative of a position of the substrate relative to the projection system, the controller being configured to control the movement system according to the signal from the detection system.

10. The apparatus of claim 1, further comprising:

an illumination system configured to supply a radiation beam, wherein the array of individually controllable elements is configured to pattern the radiation beam to provide the patterned radiation beam.