Laser system

• US 8,170,078 B2
• Filed: 01/07/2011
• Issued: 05/01/2012
• Est. Priority Date: 11/01/2005
• Status: Active Grant

• Current Assignee: Cymer Incorporated (ASML Holding NV)
• Original Assignee: Cymer Incorporated (ASML Holding NV)
• Inventors: Ershov, Alexander I., Partlo, William N., Brown, Daniel J. W., Fomenkov, Igor V., Bergstedt, Robert A., Sandstrom, Richard L., Lalovic, Ivan
• Primary Examiner(s): Stultz, Jessica
• Assistant Examiner(s): NGUYEN, TUAN N
• Application Number:
  US12/987,039
• Publication Number:
  US 20110102759A1
• Time in Patent Office: 480 Days
• Field of Search: 355/67, 372/57, 372/55, 372/58
• US Class Current: 372/57
• CPC Class Codes: H01S 2301/02 ASE (amplified spontaneous emission), noise; Reduction thereof
• CPC Class Codes: H01S 3/005 Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping shaping laser beam for working metal or other materials B23K26/06; optical elements, systems or apparatus in general G02B
• CPC Class Codes: H01S 3/0057 Temporal shaping, e.g. pulse compression, frequency chirping soliton generation and propagation G02F1/3513, H01S3/063 and H01S3/108
• CPC Class Codes: H01S 3/08004 incorporating a dispersive element, e.g. a prism for wavelength selection H01S3/0811, H01S3/08022 take precedence
• CPC Class Codes: H01S 3/08009 using a diffraction grating
• CPC Class Codes: H01S 3/083 Ring lasers fibre ring lasers H01S3/06791
• CPC Class Codes: H01S 3/10092 Coherent seed, e.g. injection locking
• CPC Class Codes: H01S 3/225 comprising an excimer or exciplex
• CPC Class Codes: H01S 3/2251 ArF, i.e. argon fluoride is comprised for lasing around 193 nm
• CPC Class Codes: H01S 3/2258 F2, i.e. molecular fluoride is comprised for lasing around 157 nm
• CPC Class Codes: H01S 3/2333 Double-pass amplifiers
• CPC Class Codes: H01S 3/2383 Parallel arrangements

Abstract

A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

Claims

1. A lithography system comprising:

a laser system configured to operate at an output pulse repetition rate of up to 12 kHz, the laser system comprising;

a seed laser oscillator producing an output comprising a laser output light beam of pulses, the seed laser oscillator comprising a first gas discharge laser chamber; and

a laser amplification stage containing an amplifying gain medium in a second gas discharge laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to a pulse energy of ≧

1 mJ to form a laser system output comprising a laser output light beam of pulses, the laser amplification stage comprising;

a regenerative closed loop optical cavity defined in part by a partially reflecting optical element through which the seed laser oscillator output light beam is injected, and

a beam de-magnification stage and a beam expansion stage within the optical cavity, wherein the beam de-magnification stage is configured to de-magnify the laser beam as the laser beam travels from the partially reflecting optical element toward the amplifying gain medium and the beam expansion stage is configured to expand the laser beam as the laser beam travels from the amplifying gain medium toward the partially reflecting optical element; and

a photolithography tool that receives the laser system output.

2. The system of claim 1, further comprising a coherence busting mechanism intermediate the seed laser oscillator and the laser amplification stage.

3. The system of claim 2, wherein the coherence busting mechanism includes an optical delay path having a delay length longer than the coherence length of a pulse in the seed laser oscillator laser output light beam of pulses.

4. The system of claim 1, further comprising a coherence busting mechanism within the photolithography tool.

5. The system of claim 1, wherein the beam expansion stage comprises at least one prism.

6. The system of claim 1, wherein the beam expansion stage comprises a two prism beam expander.

7. The system of claim 6, wherein the first prism of the two prism beam expander comprises a split prism and the second prism of the two prism beam expander comprises a one piece prism.

8. The system of claim 1, wherein the laser amplification stage is defined between a beam reverser and the partially reflecting optical element.

9. The system of claim 1, wherein the beam reverser comprises a prism that is configured to cross a light beam traveling along a first path through the amplifying gain medium with a light beam traveling along a second path through the amplifying gain medium.

10. The system of claim 1, further comprising:

a timing and energy controller selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber to thereby maintain amplified spontaneous emission below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.

11. The system of claim 10, wherein the seed laser oscillator includes a line narrowing module.

12. The system of claim 11, wherein the line narrowing module includes a bandwidth selection optic that is connected to the timing and energy controller to enable the controller to adjust the bandwidth of the pulses of the seed laser oscillator output light beam.

13. The system of claim 12, wherein:

the bandwidth selection optic comprises a grating; and

the controller is configured to cause a change in the shape of a face of the grating upon which is incident a pulse.

14. The system of claim 1, further comprising:

one or more additional laser systems designed identically to the laser system, each laser system operating at a pulsed rate of X kHz; and

a beam combining system configured to combine the output pulses from at least two of the pulsed laser systems to produce a laser system output having a laser output light beam of pulses at a pulse repetition rate of 2X kHz.

15. The system of claim 14, wherein the beam combining system comprises one or more pulse stretchers that receive the output pulses of the respective laser amplification stages.

16. The system of claim 14, wherein each of the laser systems provides output light pulse beams to the beam combining system in an overleaving fashion.

17. The system of claim 14, wherein each of the laser systems produces output pulses with interleaved firing times.

18. The system of claim 1, wherein the closed loop optical cavity comprises a bow-tie loop.

19. The system of claim 1, wherein the closed loop optical cavity comprises a race track loop.

20. The system of claim 1, wherein the seed laser oscillator comprises a line narrowing module.