Maintenance system, substrate processing apparatus, remote operation unit and communication method

• US 8,171,879 B2
• Filed: 02/17/2009
• Issued: 05/08/2012
• Est. Priority Date: 08/27/2002
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Mori, Takuya
• Primary Examiner(s): Edwards, Laura
• Application Number:
  US12/372,347
• Publication Number:
  US 20090157214A1
• Time in Patent Office: 1,176 Days
• Field of Search: 118/696, 118/708, 118/712, 700/121, 700/123, 700/15, 340/3.1, 340/3.71
• US Class Current: 118/696
• CPC Class Codes: G03F 7/70525 Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus
• CPC Class Codes: H01L 21/67276 Production flow monitoring, e.g. for increasing throughput program-control systems per se G05B19/00, e.g. total factory control G05B19/418

Abstract

A substrate processing apparatus having various types of elements including a substrate carrier member for performing a substrate processing; and a control section in which a remote operation information transmitted from a remote control unit in a remote place through a communication network is provided only when there is an allow setting of a remote operation by a worker of the substrate processing apparatus with the safety of the remote operation work being confirmed, and the various types of elements are controlled based on the provided remote operation information.

Claims

1. A substrate processing apparatus, comprising:

various types of elements including a substrate carrier member for performing a substrate processing;

a control section in which a remote operation information transmitted from a remote control unit in a remote place through a communication network is provided only when there is an allow setting of a remote operation by a worker of said substrate processing apparatus with the safety of the remote operation work being confirmed, and said various types of elements are controlled based on the provided remote operation information; and

an allow-setting section for performing the allow setting of the remote operation,

wherein in the allow-setting section, the allow setting of the remote operation is divided into plurality stages, and a first allow setting of the remote operation accompanying a driving of said substrate processing apparatus and a second allow setting of the remote operation not accompanying the driving of said substrate processing are included in separate stages,

wherein the first allow setting of the remote operation accompanying the driving of said substrate processing apparatus comprises,

a position adjustment for a substrate carrier arm, a resist solution discharge nozzle in a resist coating unit and a developing solution discharge nozzle in a developing unit, and

a movement confirmation of the substrate carrier arm, the resist solution discharge nozzle and the developing solution discharge nozzle, and

wherein the second allow setting of the remote operation not accompanying the driving of said substrate processing apparatus comprises,

a setting change for a discharge amount of the resist solution, a discharge pressure of the resist solution, a turning speed of a substrate, an atmospheric temperature and an atmospheric humidity in the resist coating unit,

a setting change for a discharge amount of the developing solution, a discharge pressure of the developing solution, an atmospheric temperature and an atmospheric humidity in the developing unit, and

a setting change for a heating temperature and a heating time of the substrate in a heating unit.

2. The substrate processing apparatus as set forth in claim 1,

the allow-setting section for performing the allow setting of the remote operation is provided only on a substrate processing apparatus side of the communication network.

3. The substrate processing apparatus as set forth in claim 1, further comprising:

a sensor for detecting an approach of a person to said substrate processing apparatus.

4. The substrate processing apparatus as set forth in claim 2,

a communication section for performing the allow setting of the remote operation only on a substrate processing apparatus side of the communication network,

wherein an information communication performed through said communication network is enabled only when there is an allow setting for a communication.

5. The substrate processing apparatus as set forth in claim 3, wherein the control section is configured to perform:

an operation for starting a detection by said sensor can be performed in the side of said substrate processing apparatus or in the side of said remote operation unit with said communication network put therebetween; and

an operation for stopping the detection by said sensor can be performed only in the side of said substrate processing apparatus.

6. The substrate processing apparatus as set forth in claim 3, wherein said sensor is configured to selectively detect the approach of the person other than workers identified in advance.

7. A substrate processing apparatus, comprising:

various types of elements including a substrate carrier member for performing a substrate processing;

a control section in which a remote operation information transmitted from a remote control unit in a remote place through a communication network is provided only when there is an allow setting of a remote operation by a worker of said substrate processing apparatus with the safety of the remote operation work being confirmed, and said various types of elements are controlled based on the provided remote operation information; and

an input section for allowing or denying the allow setting of the remote operation,

wherein in the input section, the allow setting of the remote operation is divided into plurality stages, and a first allow setting of the remote operation accompanying a driving of said substrate processing apparatus and a second allow setting of the remote operation not accompanying the driving of said substrate processing are included in separate stages,

wherein the first allow setting of the remote operation accompanying the driving of said substrate processing apparatus comprises,

a position adjustment for a substrate carrier arm, a resist solution discharge nozzle in a resist coating unit and a developing solution discharge nozzle in a developing unit, and

a movement confirmation of the substrate carrier arm, the resist solution discharge nozzle and the developing solution discharge nozzle, and

wherein the second allow setting of the remote operation not accompanying the driving of said substrate processing apparatus comprises,

a setting change for a discharge amount of the resist solution, a discharge pressure of the resist solution, a turning speed of a substrate, an atmospheric temperature and an atmospheric humidity in the resist coating unit,

a setting change for a discharge amount of the developing solution, a discharge pressure of the developing solution, an atmospheric temperature and an atmospheric humidity in the developing unit, and

a setting change for a heating temperature and a heating time of the substrate in a heating unit.