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Unified test structure for stress migration tests

  • US 8,174,010 B2
  • Filed: 12/04/2007
  • Issued: 05/08/2012
  • Est. Priority Date: 04/30/2007
  • Status: Expired due to Fees
First Claim
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1. A test structure comprising a current path chain having a first half chain and a second half chain, wherein:

  • each half chain comprises lower metallization segments, upper metallization segments, an insulating layer between the lower metallization segments and the upper metallization segments, and connection segments;

    each of said connection segments is electrically connected to a contact region of one of said lower metallization segments and to a contact region of one of said upper metallization segments to thereby electrically connect the respective lower metallization segment and the respective upper metallization segment;

    at least one of the first half chain or the second half chain comprises a width less than a width of a probe pad; and

    the first half chain and the second half chain have different configurations with different structural electrical characteristics, wherein the upper and lower metallization segments of the first half chain are different with respect to the upper and lower metallization segments of the second half chain.

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