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Liquid crystal display device and fabricating method thereof

  • US 8,179,510 B2
  • Filed: 06/29/2005
  • Issued: 05/15/2012
  • Est. Priority Date: 12/31/2004
  • Status: Active Grant
First Claim
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1. A method of fabricating a liquid crystal display device, comprising:

  • providing first and second substrates;

    a first mask process of forming a first mask pattern group including a gate line, a gate electrode, a common line, a common electrode, a data link and a lower pad electrode to be connected to the data line on the first substrate;

    a second mask process of forming a gate insulating film and a semiconductor layer on the first mask pattern group formed by the first mask process, defining a pixel hole spaced apart from the common line and a common electrode to pass through the gate insulating film and the semiconductor layer in a pixel area thereby exposing a surface of the first substrate, forming first and second contact holes for exposing the lower pad electrode and the data link and forming an upper pad electrode connected to the lower pad electrode and a contact electrode to be connected to the data link and the data line in the corresponding contact hole, and forming a pixel electrode to be contacted with the surface of the first substrate and a side wall of the gate insulating film exposed through the pixel hole in the pixel hole; and

    a third mask process of forming a source and drain metal pattern including a data line crossing the gate line to define the pixel area, a source electrode and a drain electrode on the first substrate, and exposing an active layer of the semiconductor pattern to define a channel between the source electrode and the drain electrode,wherein a portion of the drain electrode covers a part of upper surface of the pixel electrode at bottom part of the pixel hole,wherein the first to third mask processes are sequentially performed, and wherein the second mask process includes;

    forming a photo-resist pattern on the semiconductor layer;

    forming the pixel hole and the first and second contact holes using the photo-resist pattern as a mask;

    forming a transparent conductive film on the photo-resist pattern, and forming transparent conductive patterns in the pixel hole and the first and second contact holes; and

    removing the photo-resist pattern with the transparent conductive film formed on the photo-resist pattern.

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