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Dynamic fluid control system for immersion lithography

  • US 8,194,229 B2
  • Filed: 08/08/2008
  • Issued: 06/05/2012
  • Est. Priority Date: 07/01/2004
  • Status: Expired due to Fees
First Claim
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1. An apparatus comprising:

  • a stage that supports a substrate;

    an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid; and

    a pressure control system that controls pressure of the immersion liquid in the gap, the pressure control system including an actuator that is positioned to contact the immersion liquid in the gap to control the pressure of the immersion liquid in the gap.

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