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Substrate distortion measurement

  • US 8,194,242 B2
  • Filed: 07/29/2005
  • Issued: 06/05/2012
  • Est. Priority Date: 07/29/2005
  • Status: Active Grant
First Claim
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1. A distortion measurement apparatus comprising:

  • a patterning device arranged to provide a patterned beam of radiation;

    a projection system arranged to receive the patterned beam of radiation from the patterning device and to project the beam of radiation onto the substrate;

    a detector arranged to measure physical distortion of a shape of a substrate;

    a first processor programmed to receive distortion data indicating the measured physical distortion of the shape of the substrate and to transform the distortion data into a frequency domain representation; and

    a second processor programmed to receive data representative of a pattern to be provided on the patterning device, and to use the frequency domain distortion data to adjust the pattern to be provided on the patterning device.

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