Gas purification by adsorption of hydrogen sulfide
First Claim
1. Apparatus for use in purifying hydrogen by removal of impurities from a hydrogen feed gas, said apparatus comprising a flow path for said feed gas containing an adsorbent for hydrogen sulfide, said flow path having a feed direction, and said adsorbent for hydrogen sulfide comprises a silica gel having an SiO2 content of at least 99.2% and has a sulfur deposition rate of less than 0.04 wt % S per day H2S exposure when continuously exposed to a 1% H2S dry gas at 20°
- C. for seven (7) days, and an adsorbent for carbon dioxide in said flow path downstream in said feed direction from said adsorbent for hydrogen sulfide.
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Abstract
Hydrogen sulfide is removed from a hydrogen rich gas stream using adsorbents having a low loss of carbon dioxide adsorption capacity upon sulfur loading including high purity silica gels, titania or highly cross-linked, non-chemically reactive resins. The adsorbents may be used to adsorb both carbon dioxide and hydrogen sulfide, or may be used as a guard bed upstream of a separate carbon dioxide adsorbent.
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Citations
5 Claims
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1. Apparatus for use in purifying hydrogen by removal of impurities from a hydrogen feed gas, said apparatus comprising a flow path for said feed gas containing an adsorbent for hydrogen sulfide, said flow path having a feed direction, and said adsorbent for hydrogen sulfide comprises a silica gel having an SiO2 content of at least 99.2% and has a sulfur deposition rate of less than 0.04 wt % S per day H2S exposure when continuously exposed to a 1% H2S dry gas at 20°
- C. for seven (7) days, and an adsorbent for carbon dioxide in said flow path downstream in said feed direction from said adsorbent for hydrogen sulfide.
- View Dependent Claims (2, 3, 4, 5)
Specification