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High reflectance terahertz mirror and related method

  • US 8,198,590 B2
  • Filed: 10/30/2008
  • Issued: 06/12/2012
  • Est. Priority Date: 10/30/2008
  • Status: Expired due to Fees
First Claim
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1. A method comprising:

  • forming a plurality of mirror periods, wherein at least one of the mirror periods is formed by;

    bonding a first semiconductor layer to a first side of a film layer, a second semiconductor layer bonded to a second side of the film layer opposite the first side;

    forming an opening through the second semiconductor layer to expose the film layer and form a notch in the second semiconductor layer, wherein remaining portions of the second semiconductor layer form sidewalls of the notch; and

    cutting through the first semiconductor layer, the film layer, and the second semiconductor layer;

    stacking the mirror periods; and

    bonding the mirror periods together to form a high reflectance mirror, the notch in the at least one mirror period forming a cavity when the mirror periods are bonded together.

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