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Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation

  • US 8,203,126 B2
  • Filed: 07/22/2010
  • Issued: 06/19/2012
  • Est. Priority Date: 05/09/2005
  • Status: Active Grant
First Claim
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1. A method of curing a layer of dielectric material formed over a substrate, the method comprising:

  • placing the substrate having the dielectric material formed thereon on a substrate support in a substrate processing chamber;

    exposing the substrate to ultraviolet radiation from a source of ultraviolet radiation that is spaced apart from the substrate support while rotating either the ultraviolet radiation source and/or substrate at least 180 degrees relative to each other during the exposing step.

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