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Injector emitter

  • US 8,204,092 B2
  • Filed: 07/07/2006
  • Issued: 06/19/2012
  • Est. Priority Date: 08/05/2005
  • Status: Expired due to Fees
First Claim
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1. The injection superluminiscent emitter comprising a semiconducting heterostructure containing at least an active layer and waveguide layers comprising at least one sublayer, metallization layers and lateral sides, wherein in said semiconducting heterostructure in the direction of a longitudinal optical axis of the injection superluminiscent emitter at least one sequence of alternating emission generation regions and emission output regions optically coupled to at least one adjacent emission generation region is formed, wherein each of said emission output regions of said sequence of said alternating emission generation regions and said emission output regions has such compositions and thicknesses of the heterostructure layers that on an emission output side only partial restriction of emission in said emission generation region of said heterostructure is achieved, and wherein the complete restriction of emission in said emission generation region of said heterostructure of said sequence is realized in that on an outer surface of said heterostructure at least one of said metallization layers with a high emission reflection coefficient is disposed, and wherein on a surface of an external layer of said heterostructure on the side opposite of the emission output side and on the lateral sides of said injection superluminiscent emitter substances are placed the refraction index of which is significantly less than a effective refraction index of said heterostructure in said generation region, that in said output regions together with said heterostructure layers there is a semiconducting leak-in layer consisting of at least one sublayer and raising above the external surface of said generation region, that every said output region is restricted on its opposite sides in the direction of said longitudinal optical axis by output facets located under predetermined linear angles of inclination α

  • 1 and α

    2, correspondingly with respect to an external surface of said generation region and that a ratio of the refraction index nIN of said leak-in layer to the effective refraction index neff of said heterostructure in said output region with said leak-in layer is equal to a number greater than one, wherein an emission transitions, inside the semiconducting heterostructure, from the emission generation region of the at least one sequence to the at least one adjacent emission output region of the same at least one sequence.

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