Exposure method, substrate stage, exposure apparatus, and device manufacturing method

• US 8,208,117 B2
• Filed: 09/10/2008
• Issued: 06/26/2012
• Est. Priority Date: 06/13/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Owa, Soichi, Magome, Nobutaka, Hirukawa, Shigeru, Kudo, Yoshihiko, Inoue, Jiro, Kohno, Hirotaka, Nei, Masahiro, Imai, Motokatsu, Nagasaka, Hiroyuki, Shiraishi, Kenichi, Nishii, Yasufumi, Takaiwa, Hiroaki
• Primary Examiner(s): Kim, Peter B
• Assistant Examiner(s): Riddle, Christina
• Application Number:
  US12/232,063
• Publication Number:
  US 20090015808A1
• Time in Patent Office: 1,385 Days
• Field of Search: 355/30, 355/50, 355/52, 355/53, 355/55, 355 72- 75, 355/67, 355/77, 430/8, 430/30, 430/311, 250/492.1, 250/492.2, 250/492.22, 250/548
• US Class Current: 355/30
• CPC Class Codes: G03B 27/58 Baseboards, masking frames, or other holders for the sensitive material G03B27/53 takes precedence ; for electrophotographic copiers G03G15/65
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages

Abstract

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Claims

1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a pattern and a liquid, the exposure apparatus comprising:

a projection system by which an image of the pattern is projected onto the substrate through the liquid;

a movable member which is movable relative to the projection system; and

a liquid-repellent, member, at least a part of a surface of which is liquid-repellent for the liquid, being detachably provided at the movable member, wherein

the liquid-repellent member includes a first wall portion, a second wall portion disposed inside the first wall portion and a supporting portion surrounded by the second wall portion,

the supporting portion supports an underside surface of the substrate,

a top surface of the first wall portion and a top surface of the second wall portion face the underside surface of the substrate respectively, and

at least one of the top surfaces of the first wall portion and the second wall portion is liquid-repellent.

2. The exposure apparatus according to claim 1, wherein the movable member includes a channel connected to a space between the first wall portion and the second wall portion, and a pressure of the space is adjusted via the channel.

3. The exposure apparatus according to claim 2, wherein the channel is connected to a device which has a sucking function.

4. The exposure apparatus according to claim 2, wherein the channel is connected to a fluid supply source.

5. The exposure apparatus according to claim 4, wherein the fluid supply source is ambient air.

6. The exposure apparatus according to claim 4, wherein the fluid supply source is a gas supply device.

7. The exposure apparatus according to claim 1, wherein the movable member includes a channel connected to a space between the first wall portion and the second wall portion, and the liquid penetrated into the space is recovered via the channel.

8. A device manufacturing method comprising:

exposing a substrate by an exposure apparatus according to claim 1.