Exposure apparatus, exposure method, and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
- a flow-passage forming member having a supply inlet from which the liquid is supplied, the flow-passage forming member having a liquid recovery outlet in a lower surface thereof, an upper surface of the substrate facing the lower surface of the flow-passage forming member during an exposure, and the liquid supplied from the supply inlet covering only a portion of the upper surface of the substrate during the exposure;
a temperature sensor provided at the flow-passage forming member;
a substrate stage having a substrate-holding member by which the substrate is held, the substrate-holding member holding the substrate on an underside of the substrate and the substrate-holding member being movable below the supply inlet; and
a temperature adjustment system which performs temperature adjustment for the substrate-holding member depending on a temperature of the liquid to be supplied from the supply inlet onto the substrate held by the substrate-holding member.
1 Assignment
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Accused Products
Abstract
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).
55 Citations
40 Claims
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
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a flow-passage forming member having a supply inlet from which the liquid is supplied, the flow-passage forming member having a liquid recovery outlet in a lower surface thereof, an upper surface of the substrate facing the lower surface of the flow-passage forming member during an exposure, and the liquid supplied from the supply inlet covering only a portion of the upper surface of the substrate during the exposure; a temperature sensor provided at the flow-passage forming member; a substrate stage having a substrate-holding member by which the substrate is held, the substrate-holding member holding the substrate on an underside of the substrate and the substrate-holding member being movable below the supply inlet; and a temperature adjustment system which performs temperature adjustment for the substrate-holding member depending on a temperature of the liquid to be supplied from the supply inlet onto the substrate held by the substrate-holding member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An exposure apparatus which exposes a first or a second substrate by radiating an exposure light beam onto the first or second substrate through a liquid, the exposure apparatus comprising:
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a flow-passage forming member having a supply inlet from which the liquid is supplied, the flow-passage forming member having a liquid recovery outlet in a lower surface thereof, an upper surface of the substrate facing the lower surface of the flow-passage forming member during exposure; a temperature sensor provided at the flow-passage forming member; a first substrate stage having a first substrate-holding member by which the first substrate is held, the first substrate-holding member holding the first substrate on an underside of the first substrate and the first substrate-holding member being movable below the supply inlet; a second substrate stage having a second substrate-holding member by which the second substrate is held, the second substrate-holding member holding the second substrate on an underside of the second substrate and the second substrate-holding member being movable below the supply inlet; a measuring station which performs measurement for one of the substrates held by one of the stages; an exposure station which performs exposure for the substrate held by the other of the stages, the exposure station being provided with the flow-passage forming member having the supply inlet from which the liquid is supplied onto the substrate held by the other of the stages, the supplied liquid covering only a portion of the upper surface of the substrate held by the other of the stages during the exposure; and temperature adjustment systems which are provided for the first substrate stage and the second substrate stage respectively and which perform temperature adjustment for the substrate-holding member of each of the stages depending on a temperature of the liquid to be supplied from the supply inlet of the flow-passage forming member. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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21. An exposure method comprising:
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holding a substrate by a substrate-holding member on an underside of the substrate; supplying a liquid from a supply inlet onto an upper surface of the substrate held by the substrate-holding member so that the supplied liquid covers only a portion of the upper surface of the substrate held by the substrate-holding member; moving the substrate below the supply inlet; exposing the substrate by radiating an exposure light beam onto the substrate through the liquid covering the portion of the upper surface of the substrate; and measuring a temperature of the liquid supplied from the supply inlet; and controlling a temperature of the substrate-holding member depending on the measured liquid temperature. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30)
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31. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
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a flow-passing forming member having a supply inlet from which the liquid is supplied, the flow-passage forming member having a liquid recovery outlet in a lower surface thereof, an upper surface of the substrate facing the lower surface of the flow-passage forming member during an exposure, and the liquid supplied from the supply inlet covering only a portion of the upper surface of the substrate during the exposure; a temperature sensor provided at the flow-passage forming member; a substrate stage having a substrate-holding member by which the substrate is held, the substrate-holding member holding the substrate on an underside of the substrate and the substrate-holding member being movable below the supply inlet; and a temperature adjustment system which performs temperature adjustment for the substrate-holding member so that a temperature of the substrate-holding member is the same as a temperature of the liquid to be supplied onto the substrate held by the substrate-holding member. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 39, 40)
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Specification