MEMS device with independent rotation in two axes of rotation

• US 8,208,192 B2
• Filed: 04/29/2009
• Issued: 06/26/2012
• Est. Priority Date: 04/29/2008
• Status: Expired due to Fees

• Current Assignee: Micralyne, Inc. (Teledyne Technologies Incorporated)
• Original Assignee: Micralyne, Inc. (Teledyne Technologies Incorporated)
• Inventors: Keyworth, Barrie, Kornelsen, Kevin, Crawford, Jared
• Primary Examiner(s): CHOI, WILLIAM C
• Application Number:
  US12/432,607
• Publication Number:
  US 20090268270A1
• Time in Patent Office: 1,154 Days
• Field of Search: 359/198.1, 359/199.1, 359/199.2, 359/199.3, 359/199.4, 359/224.1, 359/224.2, 359/225.1, 359/226.1, 359/290, 359/298
• US Class Current: 359/290
• CPC Class Codes: B81B 2201/042 Micromirrors, not used as optical switches
• CPC Class Codes: B81B 2203/04 Electrodes
• CPC Class Codes: B81B 2203/058 Rotation out of a plane parallel to the substrate
• CPC Class Codes: B81B 2207/07 Interconnects
• CPC Class Codes: B81B 3/0062 Devices moving in two or more dimensions, i.e. having special features which allow movement in more than one dimension
• CPC Class Codes: B81B 3/0086 Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means
• CPC Class Codes: H02N 1/006 of the gap-closing type H02N1/004 takes precedence

Abstract

A MEMS arrangement is provided that has a top plane containing a rotatable element such as a mirror. There is a middle support frame plane, and a lower electrical substrate plane. The rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the frame in a first axis of rotation. The frame is mounted so as to be rotatable with respect to a second axis of rotation. Rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation.

Claims

1. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

wherein the MEMS arrangement is configured as a 1×

N array with fill-factor >

90%.

2. The MEMS arrangement according to claim 1, where the two axes are substantially orthogonal.

3. The MEMS arrangement according to claim 1, further comprising:

an actuation mechanism for actuation around the first axis.

4. The MEMS arrangement of claim 3 wherein the actuation mechanism comprises at least one of parallel plate electrostatic electrodes, vertical comb drives, electromagnetic actuators.

5. The MEMS arrangement according to claim 1, further comprising:

an actuation mechanism for actuation about the second axis.

6. A MEMS arrangement according to claim 5 wherein the actuation mechanism comprises at least one of parallel plate electrostatic electrodes, vertical comb drives, electromagnetic actuators.

7. The MEMS device of claim 1 wherein the rotatable element is a mirror.

8. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

further comprising;

actuating electrodes disposed between the rotatable element and the support frame;

where rotation around the first axis is achieved by the actuating electrodes disposed between the rotatable element and the middle support frame;

further comprising;

actuating electrodes disposed between the support frame and the lower electrical substrate;

where rotation around the second axis is achieved by the actuating electrodes disposed between the support frame and the lower electrical substrate.

9. The MEMs arrangement of claim 8 configured as a 1×

N array with fill-factor >

90%.

10. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

where the middle support frame plane comprises an upper conductive layer and a lower conductive layer separated by an insulating layer.

11. The MEMS arrangement according to claim 10, wherein:

the support frame is formed in the middle support frame plane, in part from the upper conductive layer, and in part from the lower conductive layer;

the arrangement further comprising;

vias that provide electrical connection in selected regions between the upper conductive layer and the lower conductive layer by bridging the insulating layer that separates the upper conductive layer and the lower conductive layer.

12. The MEMs arrangement of claim 11 further comprising:

electrical routing to regions of the support frame and the top plane formed using patterned conductive material.

13. The MEMs arrangement of claim 11 further comprising:

electrical routing to the electrically isolated regions of the support frame and the top plane formed using patterned conductive material.

14. The MEMs arrangement of claim 10 configured as a 1×

N array with fill-factor >

90%.

15. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

wherein;

the support frame is formed in the middle support frame plane from a conductive layer;

trenches formed in the conductive layer are filled with insulating material to form regions of the support frame that are electrically isolated from each other.

16. The MEMs arrangement of claim 15 configured as a 1×

N array with fill-factor >

90%.

17. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

further comprising;

flexible hinges providing rotation around the first axis formed in the top plane and disposed at opposing ends of the rotatable element along the first axis.

18. The MEMs arrangement of claim 17 configured as a 1×

N array with fill-factor >

90%.

19. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

flexible hinges providing rotation around the first axis formed in the middle frame layer plane and connected to opposing ends of the rotatable element along the first axis;

wherein the flexible hinges are substantially covered by the rotatable element; and

wherein the MEMS arrangement is configured as a 1×

N array with fill-factor >

90%.

20. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

flexible hinges providing rotation around the second axis formed in the middle support frame plane;

wherein the flexible hinges providing rotation about the second axis are disposed underneath the rotatable element to allow high fill-factor and maximum usable rotatable element surface area; and

wherein the MEMS arrangement is configured as a 1×

N array with fill-factor >

90%.

21. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

further comprising;

a first drive voltage source that produces a first drive voltage for driving rotation in the first axis of rotation;

a second drive voltage source that produces a second drive voltage for driving rotation in the second axis of rotation;

wherein first drive voltage is substantially lower than the second drive voltage.

22. The MEMs arrangement of claim 21 configured as a 1×

N array with fill-factor >

90%.

23. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

further comprising;

through-wafer electrical vias in the lower electrical substrate to reduce the space needed for electrical routing.

24. The MEMS arrangement according to claim 23, where the electrical vias are configured to have substantially equal pitch.

25. The MEMS arrangement according to claim 23, comprising a plurality of rows forming an N×

M mirror array.

26. The MEMs arrangement of claim 23 configured as a 1×

N array with fill-factor >

90%.

27. A MEMS arrangement comprising:

a top plane comprising a rotatable element;

a middle support frame plane,

a lower electrical substrate plane;

wherein the rotatable element is supported by a support frame formed in the middle support frame plane so as to be rotatable with respect to the middle support frame in a first axis of rotation;

wherein the frame is mounted so as to be rotatable with respect to a second axis of rotation;

wherein rotation in the first axis of rotation is substantially independent of rotation in the second axis of rotation;

further comprising;

a plurality of paths for delivery of control voltages;

a shielding element that performs some shielding between the paths for delivery of control voltages and both the support frame and the rotatable element.

28. The MEMs arrangement of claim 27 configured as a 1×

N array with fill-factor >

90%.