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Single phase fluid imprint lithography method

  • US 8,211,214 B2
  • Filed: 02/05/2008
  • Issued: 07/03/2012
  • Est. Priority Date: 10/02/2003
  • Status: Active Grant
First Claim
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1. In an imprint lithography system, a method for reducing gases trapped in viscous liquid positioned on a substrate, said method comprising:

  • providing a substrate having a viscous liquid thereon;

    placing a mold assembly in close proximity with said viscous liquid, thereby defining a processing region proximate to said substrate, said processing region having an atmosphere associated therewith; and

    varying characteristics of said atmosphere to increase a transport of gases in said atmosphere, with said transport of said gases being through either said mold assembly, said substrate, or a combination thereof.

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