Gap maintenance for opening to process chamber
First Claim
1. A semiconductor processing apparatus comprising:
- a reaction chamber comprising a baseplate including an opening;
a movable susceptor configured to hold a workpiece;
a movement element configured to move a workpiece held on the susceptor towards the opening of the baseplate; and
a control system configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber.
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Accused Products
Abstract
A semiconductor processing apparatus includes a reaction chamber, a movable susceptor, a movement element, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable susceptor is configured to hold a workpiece. The movable element is configured to move a workpiece held on the susceptor towards the opening of the baseplate. The control system is configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber. Purge gases may flow through the gap into the reaction chamber. Methods of maintaining the gap during processing include calibrating the height of pads and capacitance measurements when the susceptor is spaced from the baseplate.
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Citations
25 Claims
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1. A semiconductor processing apparatus comprising:
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a reaction chamber comprising a baseplate including an opening; a movable susceptor configured to hold a workpiece; a movement element configured to move a workpiece held on the susceptor towards the opening of the baseplate; and a control system configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of processing a semiconductor workpiece, the method comprising:
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loading a semiconductor workpiece onto a movable susceptor; moving the susceptor towards an opening in a baseplate of a reaction chamber; stopping movement of the susceptor when the susceptor is in a processing position, the susceptor spaced from the baseplate by an unsealed gap in the processing position; and processing the workpiece in the processing position while maintaining the gap. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification