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Gap maintenance for opening to process chamber

  • US 8,216,380 B2
  • Filed: 01/08/2009
  • Issued: 07/10/2012
  • Est. Priority Date: 01/08/2009
  • Status: Active Grant
First Claim
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1. A semiconductor processing apparatus comprising:

  • a reaction chamber comprising a baseplate including an opening;

    a movable susceptor configured to hold a workpiece;

    a movement element configured to move a workpiece held on the susceptor towards the opening of the baseplate; and

    a control system configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber.

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