Arc recovery without over-voltage for plasma chamber power supplies using a shunt switch

• US 8,217,299 B2
• Filed: 02/22/2007
• Issued: 07/10/2012
• Est. Priority Date: 02/22/2007
• Status: Active Grant

• Current Assignee: AES Global Holdings Pte Ltd. (Advanced Energy Industries, Inc. (China))
• Original Assignee: Advanced Energy Industries Incorporated
• Inventors: Ilic, Milan, Shilo, Vladislav V., Huff, Robert Brian
• Primary Examiner(s): Hoang, Tu B
• Assistant Examiner(s): Dang, Ket D
• Application Number:
  US11/677,786
• Publication Number:
  US 20080203070A1
• Time in Patent Office: 1,965 Days
• Field of Search: 324/536, 219/121.57, 219/121.54, 219/121.36, 219/121.43, 204/192.14, 204/192.12, 204/298, 204/192.E, 204/192.R, 315/111.21, 315/111.51, 313/231.31, 313/231.41, 313/231.51
• US Class Current: 219/121.57
• CPC Class Codes: H01J 37/32174 Circuits specially adapted for controlling the RF discharge
• CPC Class Codes: H01J 37/32623 Mechanical discharge control means
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

A system and method for over-voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc.

Claims

1. A method for applying power to a plasma chamber, comprising:

delivering power from a power supply unit to the plasma chamber to ignite and sustain a plasma;

detecting an arc in the plasma;

diverting a plasma current associated with the arc away from the plasma by closing at a first time for a first time period a shunt switch within the power supply unit so as to extinguish the arc, the shunt switch being opened at a second time at the end of the first time period when there is no arc in the plasma and a plasma voltage is at an extinguished level;

increasing the plasma voltage to reignite the plasma when the shunt switch is open; and

pulsing the shunt switch with a plurality of pulses as the plasma voltage increases after the shunt switch is opened at the second time, the shunt switch being closed during each pulse to limit increases in the plasma voltage so that the plasma voltage does not exceed a voltage limit, and the shunt switch being open during an off-time between pulses to increase the plasma voltage to a reignition level that ignites the plasma, the shunt switch remains open after the plasma is ignited until another arc is detected to sustain the plasma.

2. The method of claim 1 wherein the plurality of pulses are determined by pulse parameter values, each pulse parameter value includes at least one of a pulse width, a pulse period, a number of pulses, and the off-time between pulses.

3. The method of claim 2 further comprising:

calculating the pulse parameter value based on a plasma system parameter value.

4. The method of claim 3, wherein the plasma system parameter value includes at least one of an output inductance of the power supply unit, an output capacitance of the power supply unit, an output current of the power supply unit, or an output voltage of the power supply unit.

5. The method of claim 1, wherein the power supply unit is a first power supply unit and a second power supply unit, the shunt switch is a first shunt switch associated with first power supply unit and a second shunt switch associated with the second power supply unit, the method further comprising:

receiving a plasma system parameter value from the second power supply unit, the plasma system parameter value is used to calculate at least one of a pulse parameter value for pulsing the first shunt switch or a pulse parameter value for pulsing the second shunt switch.

6. The method of claim 1, wherein the shunt switch is a first shunt switch, wherein a second shunt switch is in parallel with the first shunt switch, and the pulsing further comprises:

pulsing the first shunt switch and the second shunt switch alternately out of phase with alternate pulses of the plurality of pulses.

7. An apparatus, comprising:

an output port that delivers power to a plasma chamber to ignite a plasma;

a shunt switch in parallel with the output port, the shunt switch is open while the output port delivers power to the plasma chamber;

a processor to control the shunt switch;

a non-transitory, tangible storage medium, encoded with instructions readable by the processor to extinguish an arc in the plasma and recover after the arc is extinguished, the instructions including instructions to;

detect an arc in the plasma;

divert a plasma current associated with the arc away from the plasma by closing at a first time for a first time period a shunt switch within the power supply unit to extinguish the arc, the shunt switch being opened at a second time at the end of the first time period when there is no arc in the plasma and a plasma voltage is at an extinguished level;

increase the plasma voltage to reignite the plasma when the shunt switch is open; and

pulse the shunt switch with a plurality of pulses as the plasma voltage increases after the shunt switch is opened at the second time, the shunt switch being closed during each pulse to limit increases in the plasma voltage so that the plasma voltage does not exceed a voltage limit, and the shunt switch being open during an off-time between pulses to increase the plasma voltage to a reignition level that ignites the plasma, the shunt switch remains open after the plasma is ignited until another arc is detected to sustain the plasma.

8. The apparatus of claim 7, wherein the pulse cycles are based on a pulse parameter value, the pulse parameter value includes at least one of a pulse width, a pulse cycle period, a number of pulses, and an off-time.

9. The apparatus of claim 7, wherein the pulse cycles are based on a pulse parameter value, the processor is configured to calculate the pulse parameter value based on a plasma system parameter value, the plasma system parameter value includes at least one of an output inductance of a power supply unit, an output capacitance of the power supply unit, an output current of the power supply unit, and an output voltage of the power supply unit.

10. The apparatus of claim 7, further comprising a memory configured to store a pulse parameter value associated with the pulse cycles.

11. The apparatus of claim 7, wherein the output port, shunt switch and processor are included in a power supply unit.